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Sr_2Rh_(1-x)Ru_xO_4 (0 ≤ x ≤ 1) composition-spread film growth on a temperature-gradient substrate by pulsed laser deposition

机译:通过脉冲激光沉积在温度梯度基板上生长Sr_2Rh_(1-x)Ru_xO_4(0≤x≤1)成分扩散膜

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摘要

K_2NiF_4-type Sr_2Rh_(1-x)Ru_xO_4 (0 ≤ x ≤ 1) composition-spread films were fabricated on (LaAlO_3)_(0.3)-(Sr_2AlTaO_6)_(0.7) (LSAT) substrate by using the combinatorial PLD method. From a temperature spread combinatorial deposition, Sr_2RhO_4 (x = 0) is found to grow epitaxially only in a narrow temperature range, i.e. 735 +- 15℃. By varying the composition and temperature along x and y axes of the substrate, respectively, two-dimensional (2D) libraries of Sr_2Rh_(1-x)Ru)xO_4 (0 ≤ x ≤ 1) films were fabricated to map the growth temperature dependence of film crystallinity for the full range of x = 0-1. The optimum epitaxial growth temperature exhibited clear dependence on the compositional variation, x. From measurements of the electric conductivity of the films, metal-insulator-metal transitions were detected as the compositional parameter x increased from 0 to 1.
机译:使用组合PLD方法在(LaAlO_3)_(0.3)-(Sr_2AlTaO_6)_(0.7)(LSAT)衬底上制作了K_2NiF_4-型Sr_2Rh_(1-x)Ru_xO_4(0≤x≤1)组成扩散膜。通过温度分布组合沉积,发现Sr_2RhO_4(x = 0)仅在狭窄的温度范围(即735±15℃)中外延生长。通过分别沿基板的x和y轴更改成分和温度,制作了Sr_2Rh_(1-x)Ru)xO_4(0≤x≤1)薄膜的二维(2D)库,以绘制生长温度依赖性在x = 0-1的整个范围内,薄膜的结晶度。最佳外延生长温度表现出明显依赖于组成变化x。从膜的电导率的测量中,随着组成参数x从0增​​加到1,检测到金属-绝缘体-金属跃迁。

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