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Growth and characteristics of ZnO thin film on CaF2 (11-21) substrate by metalorganic vapor phase epitaxy

机译:金属有机气相外延法在CaF2(11-21)衬底上生长ZnO薄膜及其特性

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Zinc oxide (ZnO) thin film was grown on CaF2 (11-21) substrate by metalorganic vapor phase epitaxy (MOVPE) and the structure, surface morphology and the opto-electrical properties of the film were investigated. It was found that preferential c-axis oriented ZnO film was highly transparent and quite smooth. In photoluminescence (PL) spectrum at 10 K, the neutral donor bound exciton ((DX)-X-0) emission was identified at 3.362 eV (I-4), the neutral acceptor bound exciton (A(0)X) emission at 3.346 eV (19). Free A- and B-exciton emissions at 3.374 eVand 3.386 eV, respectively, as well as the phonon replicas of free A-exciton and (DX)-X-0 were also observed, indicating high optical quality of the ZnO film. Temperature-dependent PL spectra demonstrated that the free exciton emission was dominant at a temperature larger than 215 K. Hall measurement showed that the ZnO/CaF2, film exhibited n-type conduction, with the resistivity of 114 Omega cm and the Hall mobility of 15.7 cm(2)/Vs. (c) 2004 Published by Elsevier B.V.
机译:通过金属有机气相外延(MOVPE)在CaF2(11-21)衬底上生长氧化锌(ZnO)薄膜,并研究了该薄膜的结构,表面形态和光电性能。发现优先c轴取向的ZnO膜是高度透明的并且相当光滑。在10 K的光致发光(PL)光谱中,中性供体结合的激子((DX)-X-0)发射被确定为3.362 eV(I-4),中性受体结合的激子(A(0)X)发射被确定为3.362 eV(I-4)。 3.346 eV(19)。还观察到分别在3.374 eV和3.386 eV的自由A和B激子发射,以及自由A激子和(DX)-X-0的声子复制品,这表明ZnO薄膜的光学质量很高。随温度变化的PL光谱表明,在大于215 K的温度下,自由激子发射是主要的。霍尔测量表明,ZnO / CaF2薄膜表现出n型导电性,电阻率为114Ω·cm,霍尔迁移率为15.7。厘米(2)/垂直(c)2004年由Elsevier B.V.

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