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Surface analytical studies of Ar-plasma etching of thin heptadecafluoro-1-decene plasma polymer films

机译:七氟-1-癸烯等离子体聚合物薄膜的Ar等离子刻蚀的表面分析研究

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摘要

An audio-frequency plasma polymerization set-up with a planar plasma source was used to deposit thin heptadecafluoro-l-decene (HDFD) plasma polymer films. The morphology and chemical structure of the films after deposition were compared with the state of the film after a subsequent Ar-plasma treatment by means of in situ Fourier transform infrared reflection absorbance spectroscopy (FT-IRRAS), X-ray photoelectron spectroscopy (XPS), time-of-flight secondary ion mass spectrometry (ToF-SIMS) and atomic force microscopy (AFM) as well as contact angle measurements. The results revealed the correlation of wettability of the model Teflon-like films with change of surface chemistry and surface topography as a result of Ar-plasma treatment. (c) 2005 Elsevier B.V. All rights reserved.
机译:具有平面等离子体源的音频等离子体聚合装置用于沉积七氟-1-癸烯(HDFD)等离子体聚合物薄膜。通过原位傅立叶变换红外反射吸收光谱(FT-IRRAS),X射线光电子能谱(XPS),将沉积后薄膜的形貌和化学结构与随后的Ar等离子体处理后的薄膜状态进行了比较。 ,飞行时间二次离子质谱(ToF-SIMS)和原子力显微镜(AFM)以及接触角测量。结果表明,由于氩气等离子处理,特氟龙样薄膜的润湿性与表面化学和表面形貌的变化相关。 (c)2005 Elsevier B.V.保留所有权利。

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