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Pulsed laser ablation of indium tin oxide in the nano and femtosecond regime: Characterization of transient species

机译:纳秒级和飞秒级脉冲激光烧蚀铟锡氧化物:瞬态物种的表征

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Tin doped indium oxide (ITO) is a n-type highly degenerate, wide band-gap semiconductor that is extensively used for many engineering applications. Pulsed laser ablation of indium tin oxide in the nano and femtosecond regime has been performed in our laboratory. Plume diagnostics has been carried out by means of a fast Intensified Coupled Charge Device (ICCD) camera. Optical emission spectroscopy has been applied to characterize the transient species produced in the nano and femtosecond regime. The time evolution of emission lines, in the femto and nanosecond regime, have been compared and discussed. In the mass spectrometry, of the ionized species, the presence of mixed metal oxide clusters has been detected. This fact is an indication that chemical reactions can occur during the plasma expansion or on the ITO surface. (c) 2005 Elsevier B.V. All rights reserved.
机译:掺锡氧化铟(ITO)是一种n型高度简并的宽带隙半导体,已广泛用于许多工程应用。在我们的实验室中,已经在纳米和飞秒范围内对铟锡氧化物进行了脉冲激光烧蚀。羽流诊断已通过快速增强耦合电荷设备(ICCD)摄像机进行。光学发射光谱已被用于表征在纳米和飞秒范围内产生的瞬态物质。已经比较和讨论了在毫微微秒和纳秒范围内发射线的时间演化。在质谱法中,已检测到离子化物种中存在混合的金属氧化物簇。该事实表明在等离子体膨胀期间或在ITO表面上可能发生化学反应。 (c)2005 Elsevier B.V.保留所有权利。

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