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Influence of oxidation time on semiconductive behaviour of thermally grown oxide films on AISI 304L

机译:氧化时间对AISI 304L上热生长氧化膜的半导体行为的影响

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The oxide films formed on AISI 304L stainless steel at 300 degrees C in the oxidation time range between 2 and 4 h have been studied by photoelectrochemistry. Photocurrents were investigated as a function of the wavelength of the incident light and the electrode potential. The investigation allowed the determination of the serniconductive properties of the oxides. The oxide films showed n-type behaviour. A duplex structure of the oxide films has been suggested on the basis of the photocurrent spectra, with an internal oxide layer having an optical gap (E-g2 = 2.16-2.3 eV) depending on the applied potential and oxidation time, higher to that of the external oxide layer (E-G1 approximate to 1.9 eV). Significant variations in the amplitude of the photocurrent were detected as a function of the applied potential and the oxidation time. (c) 2005 Elsevier B.V. All rights reserved.
机译:通过光电化学研究了在300摄氏度下AISI 304L不锈钢在2到4 h的氧化时间内形成的氧化膜。研究了光电流与入射光波长和电极电位的关系。通过研究,可以确定氧化物的导电性能。氧化膜表现出n型行为。根据光电流光谱,已经提出了一种氧化膜的双相结构,根据所施加的电势和氧化时间,内部氧化层的光隙(E-g2 = 2.16-2.3 eV)更高,大于外部氧化物层(E-G1约为1.9 eV)。检测到光电流幅度的显着变化是所施加的电势和氧化时间的函数。 (c)2005 Elsevier B.V.保留所有权利。

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