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Quantitative analysis of thin-film conductivity by scanning microwave microscope

机译:扫描电镜对薄膜电导率的定量分析

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摘要

We propose a novel method for high-throughput quantitative analysis of thin-film conductivity σ by using a scanning microwave microscope (SμM). We demonstrated that composition spread thin films of Ti_(1-x)Nb_xO_2 can be utilized as a standard reference in a wide a range. The shift in Q-value measured by SμM along the composition-spread axis showed a single peak, which moved to the lower x side with film thickness. This behavior was confirmed by electrical field simulation using the finite element method.
机译:我们提出了一种使用扫描微波显微镜(SμM)进行薄膜电导率σ高通量定量分析的新方法。我们证明了Ti_(1-x)Nb_xO_2的成分扩散薄膜可以在很大范围内用作标准参考。通过SμM沿组成扩展轴测得的Q值偏移显示一个峰,该峰随膜厚移动到x的下侧。这种行为已通过使用有限元方法的电场模拟得到了证实。

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