The Effect Of C_(60) Cluster Ion Beam Bombardment In Sputter Depth Profiling Of Organic-inorganic Hybrid Multiple Thin Films

摘要

The effects of C_(60) cluster ion beam bombardment in sputter depth profiling of inorganic-organic hybrid multiple nm thin films were studied. The dependence of SIMS depth profiles on sputter ion species such as 500 eV Cs~+, 10 keV C_(60)~+, 20 keV C_(60)~(2+) and 30 keV C_(60)~(3+) was investigated to study the effect of cluster ion bombardment on depth resolution, sputtering yield, damage accumulation, and sampling depth.