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首页> 外文期刊>Applied Surface Science >Electrodeposition And Characterization Of Thin Selenium Films Modified With Lead Ad-atoms
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Electrodeposition And Characterization Of Thin Selenium Films Modified With Lead Ad-atoms

机译:铅原子修饰的硒薄膜的电沉积与表征

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摘要

The deposition and characterization of Se films doped with Pb underpotentially deposited (UPD) ad-atoms was studied in this work. The employed experimental techniques were cyclic voltammetry, chronoamperometry, electrochemical impedance spectroscopy, UV-vis spectroscopy and atomic force microscopy. The initial deposition of Se film by chronoamperometry yielded a thin film composed of approximately 700 layers. The Pb UPD on Se was achieved by chronoamperometry in a potential value previously determined in voltammetric experiments. This deposition yielded a deposition charge of approximately 7.5% of the total one. The film resistance altered from 320 Ω cm~(-2) for Se to 65 Ω cm~(-2) for the Se/Pb one. Flat band potential values and number of acceptors and donors were also calculated for both films and the values obtained were +0.95 and -0.51 V for Se and Se/Pb, respectively. The Se coating presented 1.2 × 10~(17) cm~(-3) acceptors while the Se/Pb one presented 3.2 × 10~(17) cm~(-3) donors. The band gap values for both films were 2.4 eV and 1.9 eV, correspondingly.
机译:在这项工作中,研究了掺杂有Pb的位势沉积(UPD)吸附原子的Se膜的沉积和表征。所采用的实验技术是循环伏安法,计时电流法,电化学阻抗谱,紫外可见光谱和原子力显微镜。通过计时安培法初始沉积Se膜产生了由大约700层组成的薄膜。通过计时电流法以先前在伏安法实验中确定的电位值实现了Se上的Pb UPD。该沉积产生了总计的约7.5%的沉积电荷。薄膜电阻从Se的320Ωcm〜(-2)变为Se / Pb的65Ωcm〜(-2)。还计算了两个膜的平坦带电势值以及受体和供体的数目,并且对于Se和Se / Pb,获得的值分别为+0.95和-0.51V。硒涂层呈现1.2×10〜(17)cm〜(-3)受主,而硒/铅呈现3.2×10〜(17)cm〜(-3)供体。两种膜的带隙值分别为2.4eV和1.9eV。

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