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Surface Modification Of Indium Tin Oxide Anode With Self-assembled Monolayer Modified Ag Film For Improved Oled Device Characteristics

机译:自组装单分子膜修饰的Ag膜对铟锡氧化物阳极的表面改性以改善Oled器件的性能

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Modification of electrodes has attracted much attention in the study of organic semiconductor devices. A self-assembled monolayer (SAM) of 4-fluorothiophenol is employed to modify the Ag film on the surface of indium tin oxide (ITO) to improve the hole injection and the surface morphology. The modified anode was characterized by X-ray photoelectron spectroscopy (XPS), atomic force microscope (AFM), and UV-vis transmittance spectra. To investigate the effect of the modification on the device characteristics, typical double layer devices with the structure of anode/a-naphthylphenylbiphenyl diamine (NPB, 60 nm)/tris-(8-hydroxyquinoline) aluminum (Alq_3, 60 nm)/LiF(0.7 nm)/Al(100 nm) were fabricated using the modified anode and the bare ITO. The effect of Ag layer thickness on the device performance is also investigated. The results revealed that SAM modified ultra-thin Ag film is an effective buffer layer for organic light emitting diode. The device using the ITO/Ag (5 nm)/SAM as anode show improved device characteristics than that of using bare ITO as anode. The enhancements in luminance and efficiency are attributed to enhanced hole injection and smooth surface between anode and the organic material. The Ag thickness of 5 nm is chosen as an acceptable compromise between substrate transparency and the device performance.
机译:电极的改性在有机半导体器件的研究中引起了很多关注。采用自组装的4-氟硫代苯酚单层(SAM)修饰氧化铟锡(ITO)表面上的Ag膜,以改善空穴注入和表面形态。改性阳极通过X射线光电子能谱(XPS),原子力显微镜(AFM)和紫外可见透射光谱进行表征。为了研究改性对器件特性的影响,采用具有阳极/α-萘基苯基联苯二胺(NPB,60 nm)/三-(8-羟基喹啉)铝(Alq_3,60 nm)/ LiF(使用改性阳极和裸ITO制备了0.7 nm / Al(100 nm)。还研究了Ag层厚度对器件性能的影响。结果表明,SAM改性的超薄银膜是有机发光二极管的有效缓冲层。与使用裸ITO作为阳极相比,使用ITO / Ag(5 nm)/ SAM作为阳极的器件显示出改善的器件特性。亮度和效率的提高归因于空穴注入的增强以及阳极与有机材料之间光滑的表面。选择5 nm的Ag厚度作为基板透明度和器件性能之间的可接受折衷。

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