机译:过滤真空电弧产生的氩为主等离子体束及其衬底刻蚀
Department of Electrical and Electronic Engineering, Toyohashi University of Technology, 1 -1 Hibarigaoka, Tempaku, Toyohashi, Aichi 441-8580, Japan;
Department of Electrical and Electronic Engineering, Toyohashi University of Technology, 1 -1 Hibarigaoka, Tempaku, Toyohashi, Aichi 441-8580, Japan Itoh Optical Industrial Co., Ltd., 3-19 Miyanari, Camagori, Aichi 443-0041, Japan;
Department of Electrical and Electronic Engineering, Toyohashi University of Technology, 1 -1 Hibarigaoka, Tempaku, Toyohashi, Aichi 441-8580, Japan;
Department of Electrical and Electronic Engineering, Toyohashi University of Technology, 1 -1 Hibarigaoka, Tempaku, Toyohashi, Aichi 441-8580, Japan;
Department of Electrical and Electronic Engineering, Toyohashi University of Technology, 1 -1 Hibarigaoka, Tempaku, Toyohashi, Aichi 441-8580, Japan;
Onward Ceramic Coating Co., Ltd., Wa-13 Yoshihara, Nomi, Ishikawa 929-0111, Japan;
Onward Ceramic Coating Co., Ltd., Wa-13 Yoshihara, Nomi, Ishikawa 929-0111, Japan;
Kanagawa Industrial Technology Research Center, 705-1, Shimoimaizumi, Ebina, Kanagawa 243-0435, Japan;
Kanagawa Industrial Technology Research Center, 705-1, Shimoimaizumi, Ebina, Kanagawa 243-0435, Japan;
Hitachi Tool Engineering Ltd., 13-2, Ninomi, Narita, Chiba 2S6-0825, Japan;
Industrial Research Institute of Ishikawa, 2-1, Kuratsuki, Kanazawa, Ishikawa 929-8203, Japan;
t-shape filtered arc deposition (T-FAD) system; carbon vacuum arc; ar-dominated plasma beam; substrate etching; DLC film;
机译:利用离子束和等离子材料处理研究过滤真空电弧等离子体在TiAlN和TiSiB涂层沉积中的应用
机译:利用离子束和等离子材料处理研究过滤真空电弧等离子体在TiAlN和TiSiB涂层沉积中的应用
机译:真空电弧过滤金属等离子体在离子束和等离子体材料加工混合技术中的应用
机译:使用阴极射线管真空等离子束沉积纳米尺度的多层结构
机译:电子束生成等离子体中高级抗蚀剂蚀刻的比较。
机译:与传统束相比扁平化无滤束束的容积调制弧线放射疗法治疗鼻咽癌的可行性研究
机译:由过滤真空电弧产生的氩主导的等离子束及其基板蚀刻