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Pulsed laser deposition of fluoride glass thin films

机译:脉冲激光沉积氟化物玻璃薄膜

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The development of integrated waveguide lasers for different applications such as marking, illumination or medical technology has become highly desirable. Diode pumped planar waveguide lasers emitting in the green visible spectral range, e.g. thin films from praseodymium doped fluorozirconate glass matrix (called ZBLAN, owing to the main components ZrF_4, BaF_2, LaF_3, A1F_3 and NaF) as the active material pumped by a blue laser diode, have aroused great interest. In this work we have investigated the deposition of PnZBLAN thin films using pulsed laser radiation of λ = 193 and λ = 248 nm. The deposition has been carried out on MgF_2 single crystal substrates in a vacuum chamber by varying both processing gas pressure and energy fluence. The existence of an absorption line at 210 nm in Pr:ZBLAN leads to absorption and radiative relaxation of the absorbed laser energy of λ=193 nm preventing the evaporation of target material. The deposited thin films consist of solidified and molten droplets and irregular particulates only. Furthermore, X-ray radiation has been applied to fluoride glass targets to enhance the absorption in the UV spectral region and to investigate the deposition of X-ray treated targets applying laser radiation of λ = 248 nm. It has been shown that induced F-centres near the target surface are not thermally stable and can be easily ablated. Therefore, λ= 248 nm is not suitable for evaporation of Pr:ZBLAN.
机译:非常需要开发用于诸如标记,照明或医疗技术之类的不同应用的集成波导激光器。在绿色可见光谱范围内发射的二极管泵浦平面波导激光器掺的氟锆酸盐玻璃基质(称为ZBLAN,由于主要成分ZrF_4,BaF_2,LaF_3,AlF_3和NaF)作为由蓝色激光二极管泵浦的活性材料的薄膜引起了人们的极大兴趣。在这项工作中,我们研究了使用λ= 193和λ= 248 nm的脉冲激光辐射沉积PnZBLAN薄膜的方法。通过改变处理气体压力和能量通量,在真空室中的MgF_2单晶衬底上进行沉积。 Pr:ZBLAN中210 nm处存在吸收线会导致λ= 193 nm的吸收激光能量发生吸收和辐射弛豫,从而阻止目标材料的蒸发。沉积的薄膜仅由凝固的和熔融的液滴以及不规则的颗粒组成。此外,已将X射线辐射应用于氟化物玻璃靶,以增强在UV光谱区域的吸收并研究使用λ= 248 nm的激光辐射对X射​​线处理的靶的沉积。已经表明,目标表面附近的感应F中心不是热稳定的,并且很容易烧蚀。因此,λ= 248nm不适用于Pr:ZBLAN的蒸发。

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