Growth and characteristics of ZnO nano-aggregates electrodeposited onto p-Si(111)

摘要

In this paper we study nanocrystalline zinc oxide thin films produced by oxidation of electrodeposited zinc nanolayers on a monocrystalline p-Si(111) substrate. The electrolyte used is ZnCl_2, an aqueous solution of 4×10~(-2)mol/l concentration. Several deposits were made for various current densities, ranging from 13 mA/cm~2 to 44mA/cm~2, flowing through the solution at room temperature. A parametric study enabled us to assess the effect of the current density on nucleation potential and time as well as zinc films structure. The grazing incidence X-ray diffraction (GIXD) revealed that both Zn and ZnO films are polycrystalline and nanometric. After 1 -h oxidation of zinc films at 450 ℃ in the open air, the structural analyses showed that the obtained ZnO films remained polycrystalline with an average crystal size of about 47 nm and with (100), (002) and (101) as preferential crystallographic orientations.