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Auger electron/X-ray photoelectron and cathodoluminescent spectroscopic studies of pulsed laser ablated SrAl_2O_4:Eu~(2+),Dy~(3+) thin films

机译:脉冲激光烧蚀SrAl_2O_4:Eu〜(2 +),Dy〜(3+)薄膜的俄歇电子/ X射线光电子和阴极荧光光谱研究

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摘要

Auger electron/X-ray photoelectron and cathodoluminescent (CL) spectroscopic studies were conducted on pulsed laser deposited SrAl_2O_4:Eu~(2+),Dy~(3+) thin films and the correlation between the surface chemical reactions and the decrease in the CL intensity was determined. The Auger electron and the CL data were collected simultaneously in a vacuum chamber either maintained at base pressure or backfilled with oxygen gas. The data were collected when the films were irradiated for 14 h with 2 keV electrons. The CL emission peak attributed to the 4f~65d~1→4f~7 transitions was observed at ~521 nm and the CL intensity of the peaks degraded at different rates in different vacuum conditions. X-ray photoelectron spectroscopy (XPS) data collected from degraded films suggest that strontium oxide (SrO) and aliminium oxide (AI_2O_3) were formed on the surface of the film as a result of electron stimulated surface chemical reaction (ESSCR).
机译:对脉冲激光沉积的SrAl_2O_4:Eu〜(2 +),Dy〜(3+)薄膜进行俄歇电子/ X射线光电子和阴极发光(CL)光谱研究,以及表面化学反应与还原反应的减少之间的关系。确定CL强度。在真空室中同时收集俄歇电子和CL数据,该真空室保持在基本压力下或回充氧气。当用2 keV电子辐照薄膜14 h时收集数据。在〜521 nm处观察到归因于4f〜65d〜1→4f〜7跃迁的CL发射峰,并且在不同真空条件下,该峰的CL强度以不同的速率降解。从降解膜收集的X射线光电子能谱(XPS)数据表明,由于电子激发的表面化学反应(ESSCR),氧化锶(SrO)和氧化铝(AI_2O_3)形成在膜表面上。

著录项

  • 来源
    《Applied Surface Science》 |2010年第2期|p.512-517|共6页
  • 作者单位

    Physics Department, University of the Free State, P.O. Box 339, Bloemfontein, ZA 9300, South Africa,Department of Laboratory Technology, Dar Es Salaam Institute of Technology, P.O. Box 2958, Dar Es Salaam, Tanzania;

    Physics Department, University of the Free State, P.O. Box 339, Bloemfontein, ZA 9300, South Africa;

    Physics Department, University of the Free State, P.O. Box 339, Bloemfontein, ZA 9300, South Africa;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    SrAl_2O_4:Eu~(2+)Dy~(3+); CL; electron degradation; ESSCR;

    机译:SrAl_2O_4:Eu〜(2+)Dy〜(3+);CL;电子降解ESSCR;
  • 入库时间 2022-08-18 03:07:32

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