A study of AFM-based scratch process on polycarbonate surface and grating application

摘要

We report on the possibility of applying atomic force microscope (AFM) lithography to draw microano-structures on the surface of a polycarbonate (PC) substrate. We also fabricated a grating structure on the PC surface using the scratch method. An AFM silicon tip coated with a diamond layer was utilized as a cutting tool to scratch the surface of the sample. In order to obtain pattern depth deeper than the control method of interaction force, we used a scanner movement method which the sample scanner moves along the Z-axis. A grating of 100 μm × 150 μm was fabricated by the step and repeat method wherein the sample stage is moved in the direction of the XV-axis. The period and the depth of the grating are 500 and 50 nm, respectively. Light of 632.8 nm wavelength was diffracted on the surface of the PC substrate.