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Electrochromic and electrochemical properties of amorphous porous nickel hydroxide thin films

机译:非晶态多孔氢氧化镍薄膜的电致变色和电化学性质

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摘要

Nickel hydroxide films were prepared using the chemical bath deposition (CBD) technique. The amorphous nature of the films was confirmed by X-ray diffraction measurements. X-ray photoelectron spectroscopy (XPS) measurements showed that the films exhibited nickel hydroxide nature. The porosity of the films was studied using optical measurements. The electrochromic properties of the porous nickel hydroxide layers were investigated, using cyclic voltammetry, chronoamperometry, in situ trans-mittance, UV-vis spectroscopy, and impedance spectroscopy. The change in the optical density (AOD) was found to be 0.79 for the as-deposited nickel hydroxide films, whereas it is 0.53 and 0.50 for the films annealed at 150℃ and 200℃, respectively. The in situ transmittance and chronoamperometry curves revealed that the annealed films had a very fast colouration (t_c < 290 ms) and decolouration (t_b < 130 ms). The measured colouration efficiencies range between 30 and 40cm~2/C The impedance measurements revealed the faster colouration and good electrochromic properties for the annealed nickel hydroxide films.
机译:使用化学浴沉积(CBD)技术制备氢氧化镍膜。膜的无定形性质通过X射线衍射测量证实。 X射线光电子能谱(XPS)测量表明该膜表现出氢氧化镍性质。使用光学测量来研究膜的孔隙率。使用循环伏安法,计时电流法,原位透射率,紫外可见光谱和阻抗光谱研究了多孔氢氧化镍层的电致变色性能。发现沉积的氢氧化镍薄膜的光密度(AOD)变化为0.79,而在150℃和200℃下退火的薄膜的光密度变化(AOD)分别为0.53和0.50。原位透射率和计时电流曲线表明,退火后的薄膜具有非常快的着色(t_c <290 ms)和脱色(t_b <130 ms)。测得的着色效率在30至40cm〜2 / C之间。阻抗测量表明,退火后的氢氧化镍薄膜具有更快的着色和良好的电致变色性能。

著录项

  • 来源
    《Applied Surface Science》 |2011年第22期|p.9606-9611|共6页
  • 作者单位

    Department of Semiconductor Science, Dongguk University, Seoul 100-715, Republic of Korea;

    Thin Films Materials Laboratory, Department of physics, Shivaji University, Kolhapur 416 004, India;

    Department of Materials Science and Engineering, Chonnam National University, Gwangju 500-757, Republic of Korea;

    Department of Semiconductor Science, Dongguk University, Seoul 100-715, Republic of Korea;

    Department of Materials Science and Engineering, Chonnam National University, Gwangju 500-757, Republic of Korea;

    Thin Films Materials Laboratory, Department of physics, Shivaji University, Kolhapur 416 004, India;

    Department of Semiconductor Science, Dongguk University, Seoul 100-715, Republic of Korea;

    Department of Semiconductor Science, Dongguk University, Seoul 100-715, Republic of Korea;

    Department of Biological & Environmental Science, Dongguk University, Seoul 100-715, Republic of Korea;

    Department of Physics, Dongguk University, Seoul 100-715, Republic of Korea;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    nickel hydroxide; electrochromism; cyclic voltammetry; chronoamperometry; UV-vis spectroscopy; impedance spectroscopy;

    机译:氢氧化镍电致变色;循环伏安法计时电流法紫外可见光谱阻抗谱;
  • 入库时间 2022-08-18 03:07:09

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