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Pulsed laser ablation of zinc selenide in nitrogen ambience: Formation of zinc nitride films

机译:氮气氛下硒化锌的脉冲激光烧蚀:氮化锌膜的形成

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摘要

Zinc nitride (Zn_3N_2) thin films are prepared using pulsed laser deposition (PLD) from zinc selenide (ZnSe) target at different nitrogen ambient pressures viz. 1,3,5, 7 and 10 Pa. The films prepared with nitrogen pressures 1 and 3 Pa are amorphous in nature, whereas the films prepared at 5, 7 and 10 Pa exhibit the presence of cubic bixbyite Zn_3N_2 structure with lattice parameter very close to bulk of Zn_3N_2. The particle size calculated by Debye Scherrer's formula is in the nano regime. Surface morphology of the films is studied by SEM and AFM analysis. Optical parameters such as band gap, refractive index and porosity of the films are calculated. Moreover, the present study confers an outlook about how do various factors such as substrate temperature, reactive supplementing gas and laser-target interaction influence the film developing process during pulsed lased deposition.
机译:使用脉冲激光沉积(PLD)在不同的氮气环境压力下从硒化锌(ZnSe)靶制备氮化锌(Zn_3N_2)薄膜。 1,3,5,7和10 Pa。用氮气压力1和3 Pa制备的薄膜本质上是非晶态的,而在5、7和10 Pa的压力下制备的薄膜则显示出立方方锰锌矿Zn_3N_2结构,晶格参数非常接近到Zn_3N_2的体积。由Debye Scherrer公式计算出的粒径为纳米级。通过SEM和AFM分析研究了膜的表面形态。计算薄膜的光学参数,例如带隙,折射率和孔隙率。此外,本研究对脉冲激光沉积过程中的各种因素(例如衬底温度,反应性补充气体和激光-靶相互作用)如何影响膜显影过程提供了展望。

著录项

  • 来源
    《Applied Surface Science》 |2011年第22期|p.9269-9276|共8页
  • 作者单位

    Department of Optoelectronics, University of Kerala, Kariavattom, Trivandrum 695581, Kerala, India;

    Department of Optoelectronics, University of Kerala, Kariavattom, Trivandrum 695581, Kerala, India,Institute for Sensorics and Information Systems (ISIS), Karlsruhe University of Applied Sciences, Moltkestr. 30, D-76133, Karlsruhe, Germany;

    Department of Optoelectronics, University of Kerala, Kariavattom, Trivandrum 695581, Kerala, India;

    Department of Optoelectronics, University of Kerala, Kariavattom, Trivandrum 695581, Kerala, India;

    UGC-DAE Consortium for Scientific Research, University Campus, Khandwa road, Indore 452001, India;

    UGC-DAE Consortium for Scientific Research, University Campus, Khandwa road, Indore 452001, India;

    Department of Optoelectronics, University of Kerala, Kariavattom, Trivandrum 695581, Kerala, India;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    pulsed laser deposition; formation of zinc nitride; discontinuous thin films; cubic bixbyite structure; lattice strain; band gap energy and porosity;

    机译:脉冲激光沉积形成氮化锌;不连续的薄膜;立方方铁矿结构晶格应变带隙能和孔隙率;
  • 入库时间 2022-08-18 03:07:08

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