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Investigation of the ablation of zinc oxide thin films on copper–indium-selenide layers by ps laser pulses

机译:ps激光脉冲对铜铟硒化物层上氧化锌薄膜的烧蚀研究

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摘要

The selective laser structuring of zinc oxide thin films, which serve as the transparent negative electrodes of copper–indium-selenide (CIS) thin film solar cells, is of great common interest as it can replace the mechanical scribing of the so-called pattern 3 (P3) process step for the monolithic serial interconnection of these cells. We present an investigation of the single-pulse ablation behavior of zinc oxide thin films on glass substrates and on CIS layers and of trench scribing with 10-ps laser pulses at 1064 nm and at 532 nm. We show that the ablation behavior strongly depends on the properties of the underling substrate and that the energy required to ablate a specific volume using induced laser processes (often referred to as ‘lift off’) is considerably reduced compared to the direct ablation of zinc oxide. With laser powers below 2 W at a wavelength of 1064 nm process speeds of 6 m/s for the P3 process have been achieved.
机译:氧化锌薄膜的选择性激光结构可以用作铜-硒化铜(CIS)薄膜太阳能电池的透明负极,因此可以替代所谓的图案3 (P3)这些单元的单片串行互连的处理步骤。我们目前对玻璃基板和CIS层上的氧化锌薄膜的单脉冲烧蚀行为以及在1064 nm和532 nm处用10 ps激光脉冲刻划沟槽的研究。我们表明,烧蚀行为在很大程度上取决于下衬基板的性能,并且与直接烧蚀氧化锌相比,使用感应激光工艺烧蚀特定体积所需的能量(通常称为“剥离”)大大降低了。在1064 nm波长下使用低于2 W的激光功率,P3工艺的加工速度已达到6 m / s。

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