机译:共溅射铬和氮氧化钛薄膜的光学和疏水特性
Centre of Nanotechnology, Indian Institute of Technology Roorkee, Roorkee 247667, India,Nano Science Laboratory, Institute Instrumentation Centre, Indian Institute of Technology Roorkee, Roorkee 247667, India;
Nano Science Laboratory, Institute Instrumentation Centre, Indian Institute of Technology Roorkee, Roorkee 247667, India;
Centre of Nanotechnology, Indian Institute of Technology Roorkee, Roorkee 247667, India,Department of Metallurgical and Materials Engineering, Indian Institute of Technology Roorkee, Roorkee 247667, India;
Centre of Nanotechnology, Indian Institute of Technology Roorkee, Roorkee 247667, India,Nano Science Laboratory, Institute Instrumentation Centre, Indian Institute of Technology Roorkee, Roorkee 247667, India;
chromium oxynitride; titanium oxynitride; co-sputtering; stress; strain; contact angle; optical properties;
机译:功率变化对共溅射钛氧氮化锆薄膜的润湿性和光学性能的影响
机译:功率变化对共溅射钛氧氮化锆薄膜的润湿性和光学性能的影响
机译:功率变化对共溅射钛和氧氮化锆膜的润湿性和光学性质的影响
机译:反应磁控溅射沉积氧氮化钛薄膜:结构和物理机械性能
机译:铽/镱掺杂氧氮化铝和铽掺杂氮化铝薄膜的光学和发光性能
机译:用于NIR-II区域传感器的共溅射非晶硅锡合金薄膜的结构和光学性质
机译:功率变化对共溅射钛和氧氮化锆膜的润湿性和光学性质的影响
机译:共溅射半导体和金属绝缘体薄膜的光学和电学特性