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Investigation on the effect of Zr doping in ZnO thin films by spray pyrolysis

机译:喷雾热解法研究ZnO薄膜中Zr掺杂的影响

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摘要

Zirconium doped zinc oxide thin films with enhanced optical transparency were prepared on Corning 1737 glass substrates at the substrate temperature of 400 ℃ by spray pyrolysis method for various doping concentrations of zirconium (IV) chloride in the spray solution. The X-ray diffraction studies reveal that the films exhibit hexagonal crystal structure with polycrystalline grains oriented along (002) directioa The crystalline quality of the films is found to be deteriorating with the increase of doping concentration and acquires amorphous state for higher concentration of 8 at% in precursor solution. The average transmittance for 5at.% (solution) zirconium doped ZnO film is significantly increased to ~92% in the visible region of 500-800 nm. The room temperature photoluminescence (PL) spectra of films show a band edge between 3.41 and 3.2 eV and strong blue emission at 2.8 eV irrespective of doping concentration and however intensity increases consistently with doping levels. The vacuum annealing at 400 ℃ reduced the resistivity of the films significantly due to the coalescence of grains and the lowest resistivity of 2 x 10~(-3) Ω cm is observed for 3at.% (solution) Zr doped ZnO films which envisages that it is a good candidate for stable TCO material.
机译:通过喷涂热解法在康宁1737玻璃基板上于400℃的基板温度下制备了掺锆的氧化锌薄膜。 X射线衍射研究表明,薄膜呈现六边形晶体结构,多晶晶粒沿(002)方向取向。随着掺杂浓度的增加,薄膜的晶体质量变差,并在8时浓度更高时获得非晶态。在前体溶液中的百分比。在500-800 nm的可见光区域,掺5at。%(溶液)的锆掺杂ZnO薄膜的平均透射率显着提高到〜92%。薄膜的室温光致发光(PL)光谱显示,在3.41和3.2 eV之间的能带边缘和2.8 eV的强蓝色发射,与掺杂浓度无关,但是强度随掺杂水平而一致地增加。在400℃的真空退火下,由于晶粒的聚结,大大降低了薄膜的电阻率,对于3at。%(溶液)掺杂Zr的ZnO薄膜,最低电阻率为2 x 10〜(-3)Ωcm。它是稳定TCO材料的理想选择。

著录项

  • 来源
    《Applied Surface Science》 |2011年第21期|p.9068-9072|共5页
  • 作者单位

    Crystal Growth and Thin Film Laboratory, School of Physics, Bharathidasan University, Tiruchirappalli 620024, India;

    CENIMAT-BN and CEMOP-UNINOVA, Materials Science Department, FCT-UNL, Caparica Campus, 2829-516 Caparica, Portugal;

    Centre for Nanoscience and Nanotechnology, School of Physics, Bharathidasan University, Tiruchirappalli 620024, India;

    Crystal Growth and Thin Film Laboratory, School of Physics, Bharathidasan University, Tiruchirappalli 620024, India;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    thin films; x-ray diffraction; atomic force microscopy; optical properties and electrical properties;

    机译:薄膜;x射线衍射;原子力显微镜;光学性质和电性质;
  • 入库时间 2022-08-18 03:07:07

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