Fabrication of an integrated optical Mach-Zehnder interferometer based on refractive index modification of polymethylmethacrylate by krypton fluoride excimer laser radiation

摘要

It is known that deep ultraviolet (UV) radiation induces a refractive index increase in the surface layer of polymethylmethacrylate (PMMA) samples. This effect can be used for the fabrication of integrated optical waveguides. PMMA is of considerable interest for bio and chemical sensing applications because it is biocompatible and can be micromachined by several methods, e.g. structuring by photolithography, ablation and hot embossing. In the presented work direct UV irradiation of a common PMMA substrate by a krypton fluoride excimer laser beam through a contact mask has been used to write integrated optical Mach-Zehnder interferometers (MZI). MZI are used as sensitive bio and chemical sensors. The aim was to determine contact mask design and laser irradiation parameters for fabricating single-mode MZI for the infrared region from 1.30 μm to 1.62 μm. Straight and curved waveguides have been generated and characterized to determine the optical losses. The generation of channel waveguide structures has been optimized by a two step irradiation process to minimize the lithographic writing time and optical loss. By flood exposure to UV laser radiation in the first step the optical absorption of PMMA can be increased in the irradiated region. The required refractive index profile is then achieved with a second lithographic irradiation. The spectral behaviour of an unbalanced, integrated optical MZI fabricated by this excimer laser based contact mask method is shown for the first time. Further the optical intensity at the output port of a MZI has been measured while the optical path length difference was tuned by creating a temperature difference between the two arms of the MZI.