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Electrical characterization of surface and interface potentials on SiC

机译:SiC表面和界面电位的电特性

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Contact free vibrating capacitor results have shown that the SiC surface is more stable, compared to Si, and it is possible to identify the different (Si or C) planes on SiC substrates. The surface charge density seems to be higher after compression welding process. Electrostatic (corona) charge on the surface results in accumulation and depletion, and probably avalanche breakdown instead of equilibrium inversion. However, the equilibrium Q-V curve still can be measured starting from the inversion region. Among C-V methods the capabilities of V-Q and mercury C-V have been investigated, as two major electrical measurement techniques for SiC qualification. SiC-silicon-dioxide interfaces and SiC epitaxial layers were characterized with HF/LF C-V and V-Q. measurement techniques. These methods were developed basically for Si measurements, but they could easily be adapted for measuring SiC too.
机译:无接触振动电容器的结果表明,与Si相比,SiC表面更稳定,并且有可能在SiC基板上识别出不同的(Si或C)平面。经过压焊工艺后,表面电荷密度似乎更高。表面上的静电(电晕)电荷会导致累积和耗尽,并且可能会发生雪崩击穿,而不是平衡反转。但是,仍然可以从反演区域开始测量平衡Q-V曲线。在C-V方法中,已经研究了V-Q和汞C-V的功能,将其作为SiC鉴定的两种主要电气测量技术。用HF / LF C-V和V-Q表征SiC-SiO2的界面和SiC外延层。测量技术。这些方法基本上是为Si测量而开发的,但它们也很容易适用于测量SiC。

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