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Mechanical and electrical properties of GeSb_2Te_4 film with external voltage applied

机译:施加外部电压的GeSb_2Te_4薄膜的机械和电学性质

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摘要

A GeSb_2Te_4 (GST) film was deposited by RF magnetron sputtering with microwave electron cyclotron resonance plasma chemical vapor deposition equipment. Mechanical and electrical properties together with the morphologies of the film were studied by a nanoindenter which was equipped with nano-electrical contact resistance (nano-ECR) tool and atomic force microscope (AFM). Results show that when no voltage applied between sample and indent tip during indenting, the pile-up phenomenon was observed, the hardness and elastic modulus increases with the load mainly due to the underestimate of the contact area; when external voltages of -7 V, -8V, -9V, -10V were applied, the resistance of the film decreased with applied voltages in about four orders of magnitude, while the elastic modulus increased from 159 GPa to 233 GPa, this changing in mechanical and electrical properties demonstrated that phase change happen during intending, a shrinking region with radius of about 2.5 μm was observed around the indentation when -8V applied. Furthermore, indent load can also promote the phase change at given negative voltage.
机译:用微波电子回旋共振等离子体化学气相沉积设备通过射频磁控溅射沉积GeSb_2Te_4(GST)膜。通过配备了纳米电接触电阻(nano-ECR)工具和原子力显微镜(AFM)的纳米压头研究了薄膜的机械和电学性能。结果表明,在压痕过程中,在试样和压痕尖端之间没有施加电压时,观察到堆积现象,其硬度和弹性模量随载荷的增加而增加,这主要是由于接触面积的低估所致。当施加-7 V,-8V,-9V,-10V的外部电压时,薄膜的电阻随施加电压的四个数量级而降低,而弹性模量从159 GPa增加到233 GPa,这种变化机械和电气性能表明,在意图期间会发生相变,当施加-8V电压时,在压痕周围观察到半径约为2.5μm的收缩区域。此外,缩进负载还可以促进给定负电压下的相变。

著录项

  • 来源
    《Applied Surface Science》 |2013年第ptab期|532-537|共6页
  • 作者单位

    Center of Micro/Nano Science & Technology, Jiangsu University, 212013 Zhenjiang, China,Province Key Laboratory of Solar Cell Science, Changzhou University, 213164 Changzhou, China,Economic Development Zone Management Committee, 224400 Funing, China;

    Center of Micro/Nano Science & Technology, Jiangsu University, 212013 Zhenjiang, China;

    Center of Micro/Nano Science & Technology, Jiangsu University, 212013 Zhenjiang, China,Province Key Laboratory of Solar Cell Science, Changzhou University, 213164 Changzhou, China;

    Center of Micro/Nano Science & Technology, Jiangsu University, 212013 Zhenjiang, China;

    Economic Development Zone Management Committee, 224400 Funing, China;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    GeSb_2Te_4 film; Nanoindentation; Electric caused phase change; Mechanical and electrical properties; Phase change shrinking;

    机译:GeSb_2Te_4膜;纳米压痕电气引起的相变;机械和电气性能;相变缩小;

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