...
机译:纳秒激光干涉光刻技术直接修饰硅表面
JR3CN and CNM (Changchun University of Science and Technology), Changchun 130022, China,JR3CN and IRAC (University of Bedfordshire), Luton LU1 3JU, UK;
JR3CN and CNM (Changchun University of Science and Technology), Changchun 130022, China,JR3CN and IRAC (University of Bedfordshire), Luton LU1 3JU, UK;
JR3CN and CNM (Changchun University of Science and Technology), Changchun 130022, China;
JR3CN and CNM (Changchun University of Science and Technology), Changchun 130022, China,JR3CN and IRAC (University of Bedfordshire), Luton LU1 3JU, UK;
JR3CN and IRAC (University of Bedfordshire), Luton LU1 3JU, UK;
JR3CN and CNM (Changchun University of Science and Technology), Changchun 130022, China,JR3CN and IRAC (University of Bedfordshire), Luton LU1 3JU, UK;
Direct modification; Laser interference lithography; Silicon; Micro and nano structures;
机译:直接激光干涉光刻技术对硅表面进行微图案化
机译:使用355 nm UV激光直接进行激光干涉构图的硅晶圆表面改性的基础研究
机译:激光干涉光刻技术制备的织构硅表面的电子控制纳米摩擦学行为
机译:纳秒直接激光干涉图案的纳秒制造标本的表面改性
机译:使用大功率直接二极管激光器的激光表面改性过程的热动力学建模和实验研究。
机译:激光诱导液体辅助胶体光刻技术改变硅表面的形貌
机译:激光干涉光刻纳米光谱制备硅表面的纳米生物学性质
机译:用于193纳米准分子激光光刻的表面成像硅聚合物(重新公布新的可用性信息)