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首页> 外文期刊>Applied Surface Science >Shadowed off-axis production of Ge nanoparticles in Ar gas atmosphere by pulsed laser deposition: Morphological, structural and charge trapping properties
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Shadowed off-axis production of Ge nanoparticles in Ar gas atmosphere by pulsed laser deposition: Morphological, structural and charge trapping properties

机译:通过脉冲激光沉积在Ar气体气氛中以阴影方式离轴生产Ge纳米粒子:形态,结构和电荷俘获特性

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摘要

In this work, a novel customized shadowed off-axis deposition set-up is used to perform an original study of Ge nanoparticles (NPs) formation in an inert Ar gas atmosphere by pulsed laser deposition at room temperature varying systematically the background Ar gas pressure (P_(base)(Ar)), target-substrate distance (d) and laser repetition rate (f). The influence of these parameters on the final NPs size distributions is investigated and a fairly uniform droplets-free and non-agglomerated NPs distribution with average height (h) = 2.8 ± 0.6 nm is obtained for optimized experimental conditions (P_(base)(Ar) = 1 mbar; d = 3 cm; f= 10 Hz) with a fine control in the NPs density (from 3.2 × 10~9 cm~(-2) to 1.1 × 10~(11) cm~(-2)). The crystalline quality of as-deposited NPs investigations demonstrate a strong dependence with the Ar gas pressure and a crystalline to amorphous phase volume fraction X_c > 50% is found for P_(base)(Ar)= 2 mbar. The NPs functionality for charge trapping applications has been successfully demonstrated by capacitance-voltage (C-V) electrical measurements.
机译:在这项工作中,使用新颖的定制的偏心离轴沉积设置来通过在室温下系统改变背景Ar气压的脉冲激光沉积在惰性Ar气体气氛中进行Ge纳米颗粒(NPs)形成的原始研究( P_(base)(Ar)),目标基板距离(d)和激光重复率(f)。研究了这些参数对最终NPs尺寸分布的影响,并在优化的实验条件下获得了平均高度(h)= 2.8±0.6 nm的相当均匀的无液滴且无团聚的NPs分布(P_(base)(Ar )= 1 mbar; d = 3 cm; f = 10 Hz),并且可以很好地控制NPs密度(从3.2×10〜9 cm〜(-2)到1.1×10〜(11)cm〜(-2) )。沉积的NPs的晶体质量显示出与Ar气压的强烈依赖性,并且对于P_(base)(Ar)= 2 mbar,发现晶体到非晶相的体积分数X_c> 50%。电荷捕获应用的NPs功能已通过电容-电压(C-V)电气测量成功证明。

著录项

  • 来源
    《Applied Surface Science》 |2013年第1期|632-640|共9页
  • 作者单位

    University of Minho, Centre of Physics and Physics Department, Braga 4710-057, Portugal,Laser Processing Group, Instituto de 6ptica, CSIC, C/ Serrano 121,28006 Madrid, Spain;

    Rudjer Boskovic Institute, Bijenilka 54, 10 000 Zagreb, Croatia;

    University of Minho, Centre of Physics and Physics Department, Braga 4710-057, Portugal,FST Tanger, Physics Department, BP416 Tanger, Morocco;

    University of Minho, Centre of Physics and Physics Department, Braga 4710-057, Portugal;

    University of Minho, Centre of Physics and Physics Department, Braga 4710-057, Portugal;

    University of Minho, Centre of Physics and Physics Department, Braga 4710-057, Portugal;

    University of Minho, Centre of Physics and Physics Department, Braga 4710-057, Portugal;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Germanium; Nanostructures; Pulsed laser deposition; Charge trapping;

    机译:锗;纳米结构;脉冲激光沉积电荷陷阱;

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