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Surface morphology, cohesive and adhesive properties of amorphous hydrogenated carbon nanocomposite films

机译:非晶态氢化碳纳米复合薄膜的表面形貌,内聚力和粘合性能

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摘要

In this work, amorphous hydrogenated carbon (a-C:H), SiO_x containing a-C:H (a-C:H/SiO_x) and nitrogen-doped a-C:H/SiO_x(a-C:H:N/SiO_x) thin films were deposited on chromium thin film coated glass using a closed drift ion beam source. Acetylene gas, hexamethyldisiloxane and hydrogen or 20% nitrogen/hydrogen mixture were used as precursors. Resulting hydrogenated carbon thin film surface morphology as well as their cohesive and adhesive properties were studied using progressive loading scratch tests followed by optical microscopy analysis. Surface analysis was also performed using atomic force microscopy via topography, surface morphology parameter, height distribution histogram and bearing ratio curve based hybrid parameter measurements. The a-C:H/SiO_x and a-C:H:N/SiO_x thin films showed better mechanical strength as compared to the conventional a-C:H films. X-ray photoelec-tron spectroscopy was used to determine the chemical composition of these films. It showed increased amounts of silicon and absence of terminal oxygenated carbon bonds in a-C:H:N/SiO_x thin film which was attributed to its improved mechanical properties.
机译:在这项工作中,非晶态氢化碳(aC:H),含aC:H的SiO_x(aC:H / SiO_x)和氮掺杂的aC:H / SiO_x(aC:H:N / SiO_x)薄膜沉积在铬薄膜上使用封闭式漂移离子束源的薄膜镀膜玻璃。使用乙炔气,六甲基二硅氧烷和氢气或20%的氮气/氢气混合物作为前体。使用逐步加载刮擦测试,然后进行光学显微镜分析,研究了所得的氢化碳薄膜表面形态及其内聚性和粘合性。还使用原子力显微镜通过地形,表面形态参数,高度分布直方图和基于承载比曲线的混合参数测量来执行表面分析。与常规a-C:H薄膜相比,a-C:H / SiO_x和a-C:H:N / SiO_x薄膜显示出更好的机械强度。 X射线光电子能谱用于确定这些薄膜的化学成分。结果表明,a-C:H:N / SiO_x薄膜中硅的含量增加,并且不存在末端氧合碳键,这归因于其改善的机械性能。

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  • 来源
    《Applied Surface Science》 |2013年第1期|543-549|共7页
  • 作者单位

    Institute of Material Science, Kaunas University of Technology, Savanoriu 271, 3009 Kaunas, Lithuania;

    Institute of Material Science, Kaunas University of Technology, Savanoriu 271, 3009 Kaunas, Lithuania;

    Institute of Material Science, Kaunas University of Technology, Savanoriu 271, 3009 Kaunas, Lithuania;

    CSM Instruments SA, Rue de la Care 4,2034 Peseux, Switzerland;

    PhotoCataiytic Synthesis Group, MESA+ Institute for Nanotechnology, Faculty of Science and Technology, University of Twente, Meander 229, P.O. Box 217, 7500 AE Enschede, The Netherlands;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Amorphous hydrogenated carbon; Thin film; AFM; Scratch test; XPS;

    机译:非晶态氢化碳;薄膜;原子力显微镜划痕测试;XPS;

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