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首页> 外文期刊>Applied Surface Science >Microstructure and physical properties of sol gel derived SnO_2:Sb thin films for optoelectronic applications
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Microstructure and physical properties of sol gel derived SnO_2:Sb thin films for optoelectronic applications

机译:溶胶凝胶法制备的SnO_2:Sb薄膜的微结构和物理性能

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摘要

Antimony doped tin oxide thin films were deposited on glass substrates by sol-gel dip coating technique. X-ray diffraction pattern showed the deterioration of the crystallinity of the films with increase in antimony doping concentration. Atomic force microscopy studies showed an inhibition of grain growth with increase in Sb concentration.The rms roughness value of SnO_2:Sb thin films are found to 1% of film thickness which makes them suitable for optoelectronic applications. The film surface revealed positive skewness and high kurtosis values which make them favorable for tribological applications. The lowest resistivity (aboutlO~(-5) Ω m) was obtained for the 5mol% Sb doped SnO_2: Sb films. These films acquire n-type conductivity due to non- stoichiometry (oxygen vacancies and interstitial tin atoms) and by the addition of Sb. The optical properties of the films have been studied from transmission spectra. An average transmittance of >80% (in UV-vis region) was observed for all the films. Optical band gap energy of SnO_2: Sb films were found to vary in the range of 3.69-3.97 eV with the increase in Sb doping concentration. Photoluminescence spectra of the films exhibited an increase in the emission intensity with increase in antimony doping concentration which is due the combined effect of charge balance and decrease in grain size. The enhancement of PL intensity in the antimony doped SnO_2 thin films make it suitable for generation of solid state lighting in light emitting diode.
机译:通过溶胶-凝胶浸涂技术将掺锑的氧化锡薄膜沉积在玻璃基板上。 X射线衍射图表明,随着锑掺杂浓度的增加,膜的结晶度变差。原子力显微镜研究表明,随着Sb浓度的增加,晶粒生长受到抑制.SnO_2:Sb薄膜的均方根粗糙度值达到薄膜厚度的1%,这使其适用于光电应用。薄膜表面显示出正偏度和高峰度值,这使其很适合摩擦学应用。对于5mol%的Sb掺杂的SnO_2:Sb膜,获得最低的电阻率(约10〜(-5)Ωm)。这些膜由于非化学计量(氧空位和间隙锡原子)和添加Sb而获得n型导电性。已经从透射光谱研究了膜的光学性质。对于所有膜,观察到平均透射率> 80%(在UV-可见光区域)。随着Sb掺杂浓度的增加,SnO_2:Sb薄膜的带隙能在3.69-3.97 eV范围内变化。薄膜的光致发光光谱显示出发射强度随锑掺杂浓度的增加而增加,这归因于电荷平衡和晶粒尺寸减小的综合作用。锑掺杂的SnO_2薄膜中PL强度的增强使其适合于在发光二极管中产生固态照明。

著录项

  • 来源
    《Applied Surface Science》 |2013年第1期|95-100|共6页
  • 作者单位

    Thin film Lab, Post Graduate and Research Department of Physics, Mar Ivanios College, Thiruvananthapuram 695075, India;

    Thin film Lab, Post Graduate and Research Department of Physics, Mar Ivanios College, Thiruvananthapuram 695075, India;

    Thin film Lab, Post Graduate and Research Department of Physics, Mar Ivanios College, Thiruvananthapuram 695075, India,Department of Physics, Heera College of Engineering and Technology, Thiruvananthapuram 695568, India;

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  • 原文格式 PDF
  • 正文语种 eng
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  • 关键词

    sno_2; thin films; sol gel dip coating; optical properties; conductivity; photoluminescence;

    机译:sno_2;薄膜;溶胶凝胶浸涂;光学性质电导率光致发光;

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