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Synthesis Sol-Gel Derived Highly Transparent ZnO Thin Films for Optoelectronic Applications

机译:用于光电子应用的合成Sol-Gel衍生的高透明ZnO薄膜

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In this work, ZnO thin films were derived by sol-gel using two different techniques; dip coating and spin coating technique. The films were deposited onto glass substrate at room temperature using sol-gel composed from zinc acetate dehydrate, monoethanolamine, isopropanole, and de-ionized water, the films were preheated at 225?C for 15 min. The crystallographic structures of ZnO films were investigated using X-ray diffraction (XRD); the result shows that the good film was prepared at dip coating technique, it was polycrystalline and highly c-orientation along (002) plane, the lattice constant ratio (c/a) was calculated at (002), it was about 1.56. The structure of thin films, prepared by spin coating technique, was amorphous with low intensity and wide peaks. The optical properties of the prepared film were studied using UV-VIS spectrophotometer with the range 190 - 850 nm, and by using the fluorescence spectrometer. The optical characterization of ZnO thin films that were prepared by the dip coating method have good transmittance of about 92% in the visible region, it can be noted from the fluorescence spectrometer two broad visible emission bands centered at 380nm and 430 nm. The optical energy gaps for the direct and indirect allowed transitions were calculated, the values were equal 3.2 eV and 3.1 eV respectively. Dip coating technique create ZnO films with potential for application as transparent electrodes in optoelectronic devices such as solar cell.
机译:在这项工作中,使用两种不同的技术通过溶胶-凝胶法获得了ZnO薄膜。浸涂和旋涂技术。在室温下,使用由醋酸锌无水物,单乙醇胺,异丙醇和去离子水组成的溶胶-凝胶将薄膜沉积到玻璃基板上,然后将薄膜在225°C下预热15分钟。用X射线衍射(XRD)研究了ZnO薄膜的晶体结构。结果表明,良好的薄膜是采用浸涂法制备的,是多晶的,沿(002)面具有高c取向,计算出的晶格常数比(c / a)为(002),约为1.56。通过旋涂技术制备的薄膜结构是非晶态的,具有低强度和宽峰。使用范围为190-850 nm的UV-VIS分光光度计和荧光分光光度计研究了制备的薄膜的光学性能。通过浸涂法制备的ZnO薄膜的光学特性在可见光区域具有约92%的良好透射率,可以从荧光光谱仪中看到两个以380nm和430nm为中心的宽可见光发射带。计算了直接和间接允许跃迁的光能隙,其值分别等于3.2 eV和3.1 eV。浸涂技术可产生具有潜力的ZnO膜,可将其用作太阳能电池等光电设备中的透明电极。

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