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机译:直流磁控溅射TiO_2涂层的研究:涂层厚度,结构和形态对光催化活性的影响
Division of Materials and Surface and Engineering, Department of Mechanical Engineering, Technical University of Denmark, DK-2800 Kgs. Lyngby, Denmark;
Denmark d Unite Materiaux et Transformations, C6, Universite Lille, 59655 Villeneuve d'Ascq, France;
Laboratory of Multifunctional Materials and Structures, National Institute of Materials Physics, Magurele, RO-077125 Bucharest, Romania;
Danish Technological Institute, Tribology Centre, Teknologiparken, Building 18, Kongsvang All 29, DK-8000 Aarhus C, Denmark;
Danish Fundamental Metrology, Matematiktorvet 307, DK-2800 Kgs. Lyngby, Denmark;
Division of Materials and Surface and Engineering, Department of Mechanical Engineering, Technical University of Denmark, DK-2800 Kgs. Lyngby, Denmark;
Photocatalysis; TiO_2; Coatings; Magnetron-sputtering; Electrochemical impedance spectroscopy;
机译:界面氧化物厚度对磁控溅射铝基TiO_2涂层光催化活性的影响
机译:碳气氛对多热处理TiO_2涂层表面形貌和光催化活性的影响
机译:具有横向组成和厚度梯度的磁控溅射冠状涂层中梯度性能的理论和实验研究和所得局部晶体结构和取向
机译:悬浮等离子体喷涂参数对TiO_2涂层光催化活性的影响
机译:催化剂设计的见解:对纳米结构催化和光催化活性的形态学依赖性的系统研究
机译:SiNx扩散阻挡层厚度对溶胶-凝胶浸涂和反应磁控溅射获得的TiO2薄膜的结构性能和光催化活性的影响
机译:直流磁控溅射TiO2涂层的研究:涂层厚度,结构和形貌对光催化活性的影响