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Investigation of DC magnetron-sputtered TiO2 coatings: Effect of coating thickness, structure, and morphology on photocatalytic activity

机译:直流磁控溅射TiO2涂层的研究:涂层厚度,结构和形貌对光催化活性的影响

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摘要

The photocatalytic performance of magnetron-sputtered titanium dioxide (TiO2) coatings of different thickness in anatase crystalline structure deposited on aluminium 1050 alloy substrates was investigated using a combination of photo-electrochemistry, methylene blue decomposition, and microscopic and spectroscopic methods, such as high resolution scanning and transmission electron microscopy, atomic force microscopy and ellipsometry. The reaction resistance was measured by AC impedance, while photocurrent measurements were carried out using the zero resistance ammetry (ZRA) method. The results showed that the TiO2 grains grow in dipyramidal columns having a linear increase in surface area with increased coating thickness. The refractive index values indicate also an evolutionary growth.The refractive index values obtained for the thin coatings on aluminium substrate were well below the values reported for monocrystalline anatase. The photocatalytic performance increased with increased coating thickness, though more rapidly over a range of 100 - 500 nm thickness. The dielectric constant also increased linearly with coating thickness.
机译:结合光电化学,亚甲基蓝分解,显微和光谱学等方法,研究了沉积在铝1050合金基底上的不同厚度的磁控溅射二氧化钛(TiO2)涂层在锐钛矿晶体结构中的光催化性能。扫描和透射电子显微镜,原子力显微镜和椭偏仪。反应电阻通过交流阻抗测量,而光电流测量则使用零电阻电流测定法(ZRA)进行。结果表明,TiO2晶粒在二金字塔柱中生长,表面积随着涂层厚度的增加呈线性增加。折射率值还指示了演化的增长。在铝基材上的薄涂层获得的折射率值远低于单晶锐钛矿报道的值。光催化性能随涂层厚度的增加而增加,尽管在100-500 nm厚度范围内更为迅速。介电常数也随涂层厚度线性增加。

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