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首页> 外文期刊>Applied Surface Science >Surface passivation of aluminum alloy 6061 with gaseous trichlorosilane: A surface investigation
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Surface passivation of aluminum alloy 6061 with gaseous trichlorosilane: A surface investigation

机译:气态三氯硅烷对6061铝合金的表面钝化:表面研究

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摘要

A molecular-scale investigation of the interaction at room temperature between gaseous trichlorosilane (HSiCl_3), used as a passivating agent, and surfaces of aluminum alloy AA6061 in a polished or hydroxyla-ted state is conducted. Atomic force microscopy (AFM) and scanning electron microscopy (SEM) provide information on the topography and morphology of AA6061 before and after hydroxylation and surface passivation, while surface chemistry has been investigated by Polarization Modulation Infrared Reflection-Absorption Spectroscopy (PM-1RRAS) and X-ray photoelectron spectroscopy (XPS). Oxidation and hydroxylation of the polished alloy surface in boiling water strongly modifies the roughness of the surface, with formation of platelets and needles of oxyhydroxide A100H. PM-IRRAS and XPS reveal that, upon adsorption, HSiCl_3 dissociates and mainly forms HSiOH_n(OAI)_(3-n), HSi(OSi)_n(OAI)_(3-n) and condensed HSiO_x species, by reaction with -OH groups from the A100H surface phase. The amount of deposited Si-containing species is larger on the rough surface of the hydroxylated alloy and this deposit is accompanied by a decrease of the amount of free -OH groups evidenced by PM-IRRAS. These results can find applications in the field of functionalization of aluminum alloys. It is suggested that a homogeneous oxidation of the alloy surface prior to exposure to gaseous HSiCl_3 may enhance the adsorption of the passivating agent.
机译:对用作钝化剂的气态三氯硅烷(HSiCl_3)和铝合金A6061处于抛光或羟基状态的表面之间在室温下的相互作用进行了分子级研究。原子力显微镜(AFM)和扫描电子显微镜(SEM)提供有关AA6061羟基化和表面钝化前后的形貌和形态的信息,而表面化学已通过偏振调制红外反射吸收光谱(PM-1RRAS)和X射线光电子能谱(XPS)。抛光合金表面在沸水中的氧化和羟基化作用强烈地改变了表面的粗糙度,形成了羟基氧化物A100H的片状和针状。 PM-IRRAS和XPS表明,吸附后,HSiCl_3分解并主要与以下物质反应形成HSiOH_n(OAI)_(3-n),HSi(OSi)_n(OAI)_(3-n)和缩合的HSiO_x物种。来自A100H表面相的OH基团。在羟基化合金的粗糙表面上沉积的含Si物质的数量更大,并且该沉积伴随着PM-IRRAS证明的游离-OH基团数量的减少。这些结果可以在铝合金的功能化领域中找到应用。提出在暴露于气态HSiCl 3之前,合金表面的均匀氧化可以增强钝化剂的吸附。

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  • 来源
    《Applied Surface Science》 |2014年第15期|165-173|共9页
  • 作者单位

    Centre de Recherche Claude Delorme, Air Liquide, 1 Chemin de la Porte des Loges Les-Loges en Josas, 78350 Jouy-en-Josas, France Laboratoire de Reactivite de Surface, UMR CNRS 7197, UPMC (Universite Pierre et Marie Curie-Paris 6), site d'lvry, 3 rue Galilee, 94200 Ivry-sur-Seine,France;

    Laboratoire de Reactivite de Surface, UMR CNRS 7197, UPMC (Universite Pierre et Marie Curie-Paris 6), site d'lvry, 3 rue Galilee, 94200 Ivry-sur-Seine,France;

    Laboratoire de Reactivite de Surface, UMR CNRS 7197, UPMC (Universite Pierre et Marie Curie-Paris 6), site d'lvry, 3 rue Galilee, 94200 Ivry-sur-Seine,France;

    Laboratoire de Reactivite de Surface, UMR CNRS 7197, UPMC (Universite Pierre et Marie Curie-Paris 6), site d'lvry, 3 rue Galilee, 94200 Ivry-sur-Seine,France;

    Laboratoire de Reactivite de Surface, UMR CNRS 7197, UPMC (Universite Pierre et Marie Curie-Paris 6), site d'lvry, 3 rue Galilee, 94200 Ivry-sur-Seine,France;

    Centre de Recherche Claude Delorme, Air Liquide, 1 Chemin de la Porte des Loges Les-Loges en Josas, 78350 Jouy-en-Josas, France;

    Centre de Recherche Claude Delorme, Air Liquide, 1 Chemin de la Porte des Loges Les-Loges en Josas, 78350 Jouy-en-Josas, France;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Aluminum alloy 6061; Passivation; Hydroxylation; AFM; PM-IRRAS; XPS;

    机译:铝合金6061;钝化;羟基化;原子力显微镜PM-IRRAS;XPS;

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