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Surface properties of W-implanted TiN coatings post-treated by low temperature ion sulfurization

机译:低温离子硫化后W注入的TiN涂层的表面性能

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TiN coatings were implanted with W ions by metal vapor vacuum arc (MEVVA) source at dose of 9 x 10(17) ions/cm(2), and then they were post-treated by low temperature ion sulfurization (LTIS) at 160 degrees C. The W-implanted TiN samples were characterized before and after post-treatment of LTIS, using Scanning Electron Microscopy (SEM), Scanning Auger Microprobe (SAM), X-ray diffraction (XRD), and Nano Indenter System. Friction and wear properties were evaluated using a ball-on-disc tribometer under dry sliding in air. After post-treatment of LTIS, XRD results showed no diffraction peaks of tungsten sulfides on surfaces of W-implanted TiN coatings; W-implanted TiN coatings were sputtered by the sulfur plasma with about 36% reducing of W depth. Further, the nano-hardness decreased mainly due to the amount decreasing of Ti2N and the formation of more metal oxides on surfaces of W-implanted TiN coatings after LTIS. As a result, LTIS treatment could not well improve tribological properties of W-implanted TiN coatings. (C) 2015 Elsevier B.V. All rights reserved.
机译:通过金属蒸气真空电弧(MEVVA)源以9 x 10(17)离子/ cm(2)的剂量向TiN涂层注入W离子,然后在160度下通过低温离子硫化(LTIS)进行后处理C.使用扫描电子显微镜(SEM),扫描俄歇微探针(SAM),X射线衍射(XRD)和纳米压头系统对LTIS处理前后的W植入TiN样品进行表征。使用圆盘摩擦计在空气中干滑下评估摩擦和磨损性能。在对LTIS进行后处理后,X射线衍射结果表明,在W注入的TiN涂层表面上没有硫化钨的衍射峰。用硫等离子体溅射注入了钨的TiN涂层,使钨深度降低了约36%。此外,纳米硬度的下降主要是由于LTIS后Ti的含量减少以及W注入的TiN涂层表面形成更多的金属氧化物。结果,LTIS处理不能很好地改善W注入的TiN涂层的摩擦学性能。 (C)2015 Elsevier B.V.保留所有权利。

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