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机译:电声器件应力剪裁压电AlN薄膜的微观结构和力学性能
Univ Freiburg, IMTEK, Dept Microsyst Engn, Lab Compound Semicond Microsyst, Georges Koehler Allee 103, D-79110 Freiburg, Germany|Fraunhofer Inst Appl Solid State Phys, Tullastr 72, D-79108 Freiburg, Germany;
Bulgarian Acad Sci, Inst Mech, Acad G Bonchev Str,Bl 4, BU-1113 Sofia, Bulgaria;
Fraunhofer Inst Appl Solid State Phys, Tullastr 72, D-79108 Freiburg, Germany;
Fraunhofer Inst Appl Solid State Phys, Tullastr 72, D-79108 Freiburg, Germany;
Fraunhofer Inst Appl Solid State Phys, Tullastr 72, D-79108 Freiburg, Germany;
Fraunhofer Inst Appl Solid State Phys, Tullastr 72, D-79108 Freiburg, Germany;
Bulgarian Acad Sci, Inst Mech, Acad G Bonchev Str,Bl 4, BU-1113 Sofia, Bulgaria;
Bulgarian Acad Sci, Inst Phys Chem, Acad G Bonchev Str,Bl 11, BU-1113 Sofia, Bulgaria;
Fraunhofer Inst Appl Solid State Phys, Tullastr 72, D-79108 Freiburg, Germany;
Univ Freiburg, IMTEK, Dept Microsyst Engn, Lab Compound Semicond Microsyst, Georges Koehler Allee 103, D-79110 Freiburg, Germany|Fraunhofer Inst Appl Solid State Phys, Tullastr 72, D-79108 Freiburg, Germany;
Aluminum nitride; Thin film; Stress management; Nanoindentation; Raman mapping;
机译:用于振动能量收集的在不锈钢上生长的AlN薄膜的微观结构和压电性能
机译:用于小型纳米机电装置的高c轴取向的10 nm厚压电AlN膜的合成与表征
机译:用于小型纳米机电装置的高c轴取向的10 nm厚压电AlN膜的合成与表征
机译:薄膜体声波谐振器中AlN薄膜的纳米机械和压电特性的表征
机译:N合金化的AlN薄膜:结构,压电和磁性。
机译:溅射AlN:Er薄膜的基底温度相关特性用于Al / AlN多层涂层健康的原位发光传感
机译:rf反应磁控溅射在低温下沉积在Si上的压电Aln薄膜的表征