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首页> 外文期刊>Applied Surface Science >Cu2ZnSnS4 thin films obtained by sulfurization of evaporated Cu2SnS3 and ZnS layers: Influence of the ternary precursor features
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Cu2ZnSnS4 thin films obtained by sulfurization of evaporated Cu2SnS3 and ZnS layers: Influence of the ternary precursor features

机译:通过硫化的蒸发的Cu2SnS3和ZnS层的硫化获得的Cu2ZnSnS4薄膜:三元前体特征的影响

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Cu2ZnSnS4 (CZTS) thin films have been grown by sulfurization of Cu2SnS3 (CTS) and ZnS layers evaporated on glass substrates. Four CTS precursor films have been tested, with two different atomic compositions (Cu/Sn = 1.7 and Cu/Sn = 2.1) and substrate temperatures (350 and 450 degrees C), together with analogous ZnS layers deposited by maintaining the substrate at 200 degrees C. The sulfurization of the CTS and ZnS stacked layers was performed at 500 degrees C during 1 h. The evolution of the crystalline structure, morphology, optical and electrical properties from each CTS precursor to the CZTS compound has been studied, especially the influence of the ternary precursor features on the quaternary film characteristics. The kesterite structure has been identified after sulfurization of the various samples, with main (112) orientation and mean crystallite sizes S-112 =40-56 nm, being higher for the Cu-poor compositions. The CZTS average roughness has varied in a wide interval R-a = 8-66 nm, being directly related to the CTS precursor layer, which becomes rougher for a higher deposition temperature or Cu content. Besides, the band gap energy and the electrical resistivity of the CZTS films have changed in the ranges E-g = 1.54-1.64 eV and rho = 0.2-40 Omega cm, both decreasing when the Cu content and/or the surface roughness increase. (C) 2016 Elsevier B.V. All rights reserved.
机译:通过硫化Cu2SnS3(CTS)和蒸发在玻璃基板上的ZnS层,可以生长Cu2ZnSnS4(CZTS)薄膜。已经测试了四张CTS前驱膜,具有两种不同的原子组成(Cu / Sn = 1.7和Cu / Sn = 2.1)和衬底温度(350和450摄氏度),以及通过将衬底保持在200度而沉积的类似ZnS层CTS和ZnS堆叠层的硫化在1小时内于500摄氏度下进行。研究了从每种CTS前体到CZTS化合物的晶体结构,形态,光学和电学性质的演变,特别是三元前体特征对四元膜特性的影响。在对各种样品进行硫化后,已鉴定出钾长石结构,主(112)取向和平均微晶尺寸S-112 = 40-56 nm,对于贫铜组合物而言更高。 CZTS平均粗糙度在R-a = 8-66 nm的宽范围内变化,与CTS前体层直接相关,对于更高的沉积温度或Cu含量,CZTS前体层变得更粗糙。此外,CZTS膜的带隙能量和电阻率在E-g = 1.54-1.64eV和rho =0.2-40Ωcm的范围内变化,当Cu含量和/或表面粗糙度增加时都减小。 (C)2016 Elsevier B.V.保留所有权利。

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