机译:微波等离子体化学气相沉积法制备掺钛金刚石薄膜的形貌与结构
Inner Mongolia Univ Sci & Technol, Sch Mech Engn, Baotou 014010, Inner Mongolia, Peoples R China;
Inner Mongolia Univ Sci & Technol, Sch Mech Engn, Baotou 014010, Inner Mongolia, Peoples R China;
Inner Mongolia Univ Sci & Technol, Sch Mech Engn, Baotou 014010, Inner Mongolia, Peoples R China;
Inner Mongolia Univ Sci & Technol, Sch Mech Engn, Baotou 014010, Inner Mongolia, Peoples R China;
Inner Mongolia Univ Sci & Technol, Sch Mech Engn, Baotou 014010, Inner Mongolia, Peoples R China;
Inner Mongolia Univ Sci & Technol, Sch Mech Engn, Baotou 014010, Inner Mongolia, Peoples R China;
Inner Mongolia Univ Sci & Technol, Sch Mech Engn, Baotou 014010, Inner Mongolia, Peoples R China;
Ti-doped diamond films; Microwave plasma chemical vapor deposition (MPCVD); Microstructure; Secondary nucleation; Preferred orientation;
机译:热阴极直流等离子体化学气相沉积法制备掺硼金刚石薄膜的形貌和结构性能
机译:流量比对微波等离子体化学气相沉积氢化非晶碳膜表面形貌和结构的影响
机译:气源对微波等离子体增强化学气相沉积法制备纳米晶金刚石膜沉积的影响
机译:微波等离子体化学气相沉积法制备纳米金刚石膜的研究。
机译:通过等离子体辅助化学气相沉积制备的类金刚石碳膜的热降解和摩擦学行为。
机译:使用He / H2 / CH4 / N2气体混合物通过微波等离子体化学气相沉积法合成超光滑纳米结构金刚石膜
机译:微波等离子体增强化学气相沉积法沉积厚而薄的纳米晶金刚石膜
机译:通过微波等离子体辅助化学气相沉积在高温下高生长率同质外延金刚石膜沉积