CoPt/TiN films nanopatterned by RF plasma etching towards dot-patterned magnetic media

摘要

Highlights•A novel nanopatterning technique proposed recently is applied to CoPt thin films.•CoPt films are transformed to L10structure both before and after nanopatterning.•Dot-patterned CoPt films with surface-perpendicular magnetic easy axis were obtained.•Feature size can be reduced to <20nm and possible to scale to industrial throughput.•Our work can be considered as a possibility to realize Bit Patterned Media (BPM).AbstractCoPt thin films as possible candidates for Bit Patterned magnetic Media (BPM) were prepared and investigated by electron microscopy techniques and magnetic measurements. The structure and morphology of the Direct Current (DC) sputtered films with N incorporation were revealed in both as-prepared and annealed state. Nanopatterning of the samples was carried out by means of Radio Frequency (RF) plasma etching through a Langmuir-Blodgett film of silica nanospheres that is a fast and high throughput technique. As a result, the samples with hexagonally arranged 100 nm size separated dots of fct-phase CoPt were obtained. The influence of the order of nanopatterning and anneling on the nanostructure formation was revealed. The magnetic properties of the nanopatterned fct CoPt films were investigated by Vibrating Sample Magnetometer (VSM) and Magnetic Force Microscopy (MFM). The results show that CoPt thin film nanopatterned by means of the RF plasma etching technique is promising candidate to a possible realization of BPM. Furthermore, this technique is versatile and suitable for scaling up to technological and industrial applications.