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首页> 外文期刊>Applied Superconductivity, IEEE Transactions on >Influence of Buffer Layer Surface Morphology on YBCO Critical Current Density Deposited on NiW Tapes
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Influence of Buffer Layer Surface Morphology on YBCO Critical Current Density Deposited on NiW Tapes

机译:缓冲层表面形态对沉积在NiW胶带上的YBCO临界电流密度的影响

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摘要

YBCO thin films were grown on NiW tapes under continuous moving deposition process. All of YBCO layer, buffer layer, and cap layer were deposited in a compact reel-to-reel pulsed laser deposition system. Since high critical current density is the most important and effective factor to improve performance/price ratio of coated conductor for large scale applications, we focused our research work on enhancing critical current density of YBCO layers on NiW substrates. It was found that superconducting transport properties of YBCO layers were dependent on not only in-plane texture but also surface morphology of buffer layers, especially surface structure and large particles along grain boundary in NiW substrates. High quality YBCO layers with $>4.0times 10^{6} {rm A/cm}^{2}$ (at 77 K, in zero magnetic field) were fabricated on cap layers with nano-scale surface roughness.
机译:在连续移动沉积过程中,在NiW胶带上生长YBCO薄膜。 YBCO层,缓冲层和保护层的所有层均在紧凑的盘到盘脉冲激光沉积系统中沉积。由于高临界电流密度是提高大规模应用中涂层导体性能/价格比的最重要和有效的因素,因此我们的研究工作集中在提高NiW基板上YBCO层的临界电流密度上。发现YBCO层的超导传输特性不仅取决于面内织构,而且还取决于缓冲层的表面形态,特别是NiW衬底中沿晶界的表面结构和大颗粒。在纳米厚度的帽盖层上制作高质量的YBCO层,其厚度为$> 4.0×10 ^ {6} {rm A / cm} ^ {2} $ (在77 K,零磁场下)尺度的表面粗糙度。

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