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首页> 外文期刊>Applied solar energy >Studies on the Photochemical Deposition (PCD) of II-VI Compound Semiconductor Thin Films of ZnS from Aqueous Solution
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Studies on the Photochemical Deposition (PCD) of II-VI Compound Semiconductor Thin Films of ZnS from Aqueous Solution

机译:水溶液中ZnS II-VI化合物半导体薄膜的光化学沉积(PCD)研究

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摘要

Zinc sulphide (ZnS) thin films were depositedon Indium oxide coaled glass substrates by Photo Chemical Deposition (PCD) with starting precursor of Zinc sulphate and sodium thiosulphate as a source material for Zn and S respectively. In addition the pH was varied (3 to 8) using sulphuric acid by adding up in the precursor. Later the ZnS thin films were annealed at 500℃ and it was found that crystalline structure was improved. Zinc blende crystalline structure was observed on the thin films using X-ray diffractometer (XRD). The morphological behavior was observed using Scanning electron microscope (SEM) and it reveals that the size of the grain increases after annealing at 500℃. UV-spectrometer was used to analyze the aqueous solution optical behavior before and after deposition. The average thickness of thin film was estimated as ~1.02 micron measured by stylus profilometer method.
机译:硫化锌(ZnS)薄膜通过光化学沉积(PCD)沉积在氧化铟碳化玻璃基板上,其中硫酸锌和硫代硫酸钠的起始前体分别作为Zn和S的原料。另外,通过添加到前体中,使用硫酸来改变pH(3至8)。 ZnS薄膜随后在500℃退火,发现其晶体结构得到改善。使用X射线衍射仪(XRD)在薄膜上观察到锌共混物的晶体结构。用扫描电子显微镜(SEM)观察其形貌行为,发现在500℃退火后晶粒尺寸增大。用紫外光谱仪分析水溶液在沉积前后的光学行为。用触针轮廓仪法测得的薄膜平均厚度约为〜1.02微米。

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  • 来源
    《Applied solar energy》 |2011年第3期|p.239-242|共4页
  • 作者单位

    School of Physical Sciences and Nano Technology, SRM University, Anna University, India;

    School of Physical Sciences and Nano Technology, SRM University, Anna University, India;

    School of Physical Sciences and Nano Technology, SRM University, Anna University, India;

  • 收录信息 美国《工程索引》(EI);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
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