Development of a target for laser-produced plasma EUV light source using Sn nano-particles

摘要

Nano-structured and tin-based targets have been fabricated by the pulsed-laser ablation method, in order to develop efficient and debris-free targets for the laser-produced plasma extreme ultraviolet (EUV) light source at 13.5 nm. Characteristic spectra that have the radiation peak around 13.5 nm were obtained from CO_2 laser produced plasma using the films as a target. A nano-structured target produced EUV light as intense as a bulk target and a narrower line spectrum at 13.5 nm than a bulk target.