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首页> 外文期刊>Applied Physics. A, Materials Science & Processing >Pulsed laser deposition of Er:BaTiO_3 for planar waveguides
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Pulsed laser deposition of Er:BaTiO_3 for planar waveguides

机译:用于平面波导的Er:BaTiO_3的脉冲激光沉积

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摘要

Laser radiation is used for the deposition of dielectric erbium doped BaTiO_3 thin films for photonic applications. Pulsed laser deposition with KrF excimer laser radiation (wavelength 248 nm, pulse duration 20 ns) is used to grow dense, transparent, amorphous, poly-crystalline and single crystalline erbium doped BaTiO_3 thin films. Visible emission due to up-conversion luminescence (wavelength 528 nm and 548 nm) under excitation with diode laser radiation at a wavelength of 970-985 nm is investigated as a function of the erbium concentration of 1-20 mol % and structural film properties.
机译:激光辐射用于沉积用于光子应用的掺dielectric的BaTiO_3介电薄膜。使用KrF受激准分子激光辐射(波长248 nm,脉冲持续时间20 ns)进行脉冲激光沉积可生长致密,透明,非晶,多晶和单晶的掺BaTiO_3薄膜。研究了在波长为970-985 nm的二极管激光辐射的激发下,由于上转换发光(波长528 nm和548 nm)而产生的可见发射与as浓度1-20 mol%和结构膜性能的关系。

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