The influence of the operation parameters on the properties of thin films produced by a modified pulsed arc process

摘要

Originally, modified pulsed arc discharge was used for reactive coatings, for example for the deposition of nitrides on different substrate materials. Scientific studies of this process have shown that the droplet emission, in comparison to the direct current (DC) random arc process, is strongly reduced by the operation of a pulsed arc. Recently, the influence of the process parameters on the properties of the thin films produced was investigated. The interesting film properties from our work are the layer structure, the surface roughness and the micro-hardness. Electrical arc parameters, for example pulse current and pulse frequency, bias voltage and deposition conditions, like pressure, influence the thin-film properties in different ways. The dependence of the layer properties on the different operating parameters of the coating process are demonstrated and discussed. Furthermore, the plasma was investigated by optical emission spectroscopy in respect to composition and ion charge. The results obtained are used to discuss the influence of the operation conditions of the modified pulsed arc process on the properties of the layers produced.