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首页> 外文期刊>Japanese journal of applied physics >Dependence of Processing Parameters on Structural Properties and Microstructures of Pulsed Laser Deposited LiMn_2O_4 Thin Films
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Dependence of Processing Parameters on Structural Properties and Microstructures of Pulsed Laser Deposited LiMn_2O_4 Thin Films

机译:工艺参数对脉冲激光沉积LiMn_2O_4薄膜结构和微观结构的影响

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摘要

LiMn_2O_4 thin films grown on a Pt/Ti/SiO_2/Si(100) substrate by pulsed laser deposition were studied with focusing on the effects of growth parameters on crystallographic and structural characteristics. The growth parameters, namely oxygen pressure, target-substrate distance, laser energy density, pulse frequency and substrate temperature were established in a sequential manner to obtain smooth, dense and single-phase LiMn_2O_4 films. The smooth, dense UMn_2O_4 single-phase thin films were found to show the improved cycle performance of cathode of thin film battery.
机译:研究了通过脉冲激光沉积在Pt / Ti / SiO_2 / Si(100)衬底上生长的LiMn_2O_4薄膜,重点研究了生长参数对晶体学和结构特征的影响。依次建立氧气压力,靶-基片距离,激光能量密度,脉冲频率和基片温度等生长参数,以获得光滑,致密的单相LiMn_2O_4薄膜。发现光滑,致密的UMn_2O_4单相薄膜显示出改善的薄膜电池阴极循环性能。

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  • 来源
    《Japanese journal of applied physics》 |2009年第7issue1期|075501.1-075501.6|共6页
  • 作者单位

    Thin Film Materials Research Center, Korea Institute of Science and Technology, Seoul 136-791, Republic of Korea Department of Materials Science and Engineering, Yonsei University, Seoul 120-749, Republic of Korea;

    Department of Materials Science and Engineering, Yonsei University, Seoul 120-749, Republic of Korea;

    Materials Science and Technology Research Division, Korea Institute of Science and Technology, Seoul 136-791, Republic of Korea;

    Department of Materials Science and Engineering, Yonsei University, Seoul 120-749, Republic of Korea;

    Thin Film Materials Research Center, Korea Institute of Science and Technology, Seoul 136-791, Republic of Korea;

    Thin Film Materials Research Center, Korea Institute of Science and Technology, Seoul 136-791, Republic of Korea;

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