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首页> 外文期刊>Applied Physics. A, Materials Science & Processing >Nanostructuring of silicon surface by femtosecond laser pulse mediated with enhanced near-field of gold nanoparticles
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Nanostructuring of silicon surface by femtosecond laser pulse mediated with enhanced near-field of gold nanoparticles

机译:飞秒激光脉冲增强金纳米粒子近场介导的硅表面纳米结构

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Nanostructure fabrication on a silicon substrate using a near-field electromagnetic enhancement in the vicinity of gold nanoparticles is studied. Experimental and theoretical investigations are made in order to clarify the properties of the nanoholes produced. The obtained results show that this nanofabrication technique is a flexible method for precise surface nanostructuring. Gold particles with diameters of 40, 80, or 200 nm are placed on the silicon substrate by a spin-coating method, and a 100 fs laser pulse (λ = 820 nm) is used to irradiate the samples. A theoretical treatment of the results obtained is made by FDTD (finite difference time domain) simulation and calculations of the near field scattering cross section based on Mie's theory. The effect of the laser fluence, polarization, and particle size and arrangement on the nanohole properties is studied. The nanohole profiles correspond to the field distributions on the substrate in the low laser fluence region. By using a lower laser fluence than the ablation threshold of bulk silicon, a hole with a diameter of about 40 nm can be produced using a 200 nm gold particle. Furthermore, the gold particles exhibit a considerable field enchantment even at gold particle sizes of a few tens of nanometers, which offers a good opportunity for further decreases in the size of the produced structures. A highest electric field enhancement factor of about 26 is obtained for particles with a diameter of 200 nm. With the decrease of the particle size the field enhancement also decreases. Particle arrangement on the substrate surface strongly affects both the electric field distribution and the enhancement effect of the particles. The highest enhancement for a particle pair is obtained when the polarization of the incident radiation is parallel to the pair axis (longitudinal mode). A good correlation is obtained between the near-field distribution predicted by FDTD simulation and the parameters of the experimentally produced nanoholes.
机译:研究了使用金纳米粒子附近的近场电磁增强技术在硅基板上进行纳米结构制造。为了阐明所产生的纳米孔的性质,进行了实验和理论研究。所得结果表明,这种纳米加工技术是用于精确表面纳米结构化的灵活方法。通过旋涂法将直径为40、80或200 nm的金颗粒放置在硅基板上,并使用100 fs激光脉冲(λ= 820 nm)照射样品。通过FDTD(有限差分时域)模拟和基于米氏理论的近场散射截面计算,对所得结果进行了理论处理。研究了激光通量,偏振,粒径和排列方式对纳米孔性能的影响。纳米孔轮廓对应于低激光注量区域中基板上的场分布。通过使用比块状硅的烧蚀阈值低的激光通量,可以使用200nm的金颗粒产生直径约为40nm的孔。此外,即使在几十纳米的金颗粒尺寸下,金颗粒也显示出相当大的场结界,这为进一步减小所产生的结构的尺寸提供了良好的机会。对于直径为200 nm的颗粒,可获得约26的最高电场增强因子。随着粒径的减小,场增强也减小。基材表面上的颗粒排列会强烈影响电场分布和颗粒的增强效果。当入射辐射的偏振平行于粒子对轴(纵向模式)时,可以获得粒子对的最高增强。通过FDTD模拟预测的近场分布与实验产生的纳米孔的参数之间具有良好的相关性。

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