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首页> 外文期刊>Applied Physics >Suppressed intermixing in InAlGaAs/ AlGaAs/GaAs and AlGaAs/GaAs quantum well heterostructures irradiated with a KrF excimer laser
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Suppressed intermixing in InAlGaAs/ AlGaAs/GaAs and AlGaAs/GaAs quantum well heterostructures irradiated with a KrF excimer laser

机译:用KrF准分子激光器辐照的InAlGaAs / AlGaAs / GaAs和AlGaAs / GaAs量子阱异质结构中的抑制混合

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摘要

The influence of gallium arsenide surface modification induced by irradiation with a KrF excimer laser on the magnitude of the quantum well (QW) intermixing effect has been investigated in InAlGaAs/AlGaAs/GaAs QW heterostructures. The irradiation in an air environment with laser pulses of fluences between 60 and 100mJ/cm~2 has resulted in the formation of a gallium oxide-rich film at the surface. Following the annealing at 900℃. up to 35 nm suppression of the band gap blue shift was observed in all the laser irradiated samples when compared to the non-irradiated samples. The origin of suppression has been discussed in terms of stress controlled diffusion.
机译:在InAlGaAs / AlGaAs / GaAs QW异质结构中,研究了用KrF准分子激光辐照引起的砷化镓表面改性对量子阱(QW)混合效应大小的影响。在空气环境中用注量在60和100mJ / cm〜2之间的激光脉冲进行辐照导致在表面形成了富氧化镓膜。在900℃下退火。与未辐照样品相比,在所有激光辐照样品中均观察到高达35 nm的带隙蓝移抑制。抑制的起源已根据应力控制扩散进行了讨论。

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