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High temperature dependence of the density of two-dimensional electron gas in Al_(0.18)Ga_(0.82)N/GaN heterostructures

机译:Al_(0.18)Ga_(0.82)N / GaN异质结构中二维电子气密度的高温依赖性

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摘要

Temperature dependence of the density of two-dimensional electron gas (2DEG) in Al_(0.18)Ga_(0.82)N/GaN heterostructures has been investigated by means of high temperature Hall measurements ranging from room temperature to 500℃. It is found that the 2DEG density decreases with increasing temperature in the range from room temperature to 250℃, and then increases with the temperature above 250℃. It is thought that the decrease of the 2DEG density from room temperature to 250℃ is caused by the reduction of the conduction band offset at high temperatures. The increase of measured 2DEG density at higher temperatures is attributed to the background electron concentration in the GaN layer. Theoretical calculation of the 2DEG density in Al_(0.18)Ga_(0.82)N/GaN heterostructures at various temperatures is consistent with the experimental results using the multilayer Hall effect model.
机译:通过室温至500℃的高温霍尔测试,研究了Al_(0.18)Ga_(0.82)N / GaN异质结构中二维电子气(2DEG)密度的温度依赖性。发现在室温至250℃范围内,2DEG密度随温度升高而降低,而在250℃以上则升高。人们认为2DEG密度从室温降低到250℃是由于高温下导带偏移的减少所致。在较高温度下测得的2DEG密度的增加归因于GaN层中的本底电子浓度。在不同温度下Al_(0.18)Ga_(0.82)N / GaN异质结构中2DEG密度的理论计算与多层霍尔效应模型的实验结果一致。

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