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首页> 外文期刊>Applied Physics. A, Materials Science & Processing >X-ray photoemission study of MgB_2 films synthesized from in-situ annealed MgB_2/Mg multilayers
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X-ray photoemission study of MgB_2 films synthesized from in-situ annealed MgB_2/Mg multilayers

机译:原位退火MgB_2 / Mg多层膜合成的MgB_2薄膜的X射线光发射研究

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摘要

Superconducting MgB_2 films were obtained by in-situ annealing of precursor multilayers deposited at low substrate temperature by sputtering from a MgB_2 stoichiometric target and by thermal evaporation of pure Mg. After an in-situ annealing at 500-600℃, the films showed a zero resistance critical temperature up to 31 K. The as-obtained MgB_2 films were investigated by X-ray photoelectron spectroscopy (XPS) and X-ray auger electron spectroscopy (XAES). The electronic structure was studied by monitoring the B 1s, Mg 2p, O 1s core-levels and the Mg KL_2L_3 Auger line. For comparison, the electronic structure of an MgB_2 commercial superconducting sputtering target, of a not-annealed precursor film and of a sample obtained by direct sputtering from the MgB_2 target have also been investigated. Electron spectroscopy showed that in the superconducting systems the Mg KL_2L_3 Auger line kinetic energy position is always higher by about 0.9 eV with respect to the energy position of the same Auger line measured in the non-superconducting samples.
机译:通过从MgB_2化学计量目标溅射并在纯Mg上进行热蒸发,通过在较低的基板温度下沉积的前驱体多层原位退火获得超导MgB_2膜。在500-600℃下原位退火后,薄膜的零电阻临界温度高达31K。通过X射线光电子能谱(XPS)和X射线俄歇电子能谱(XPS)研究了所获得的MgB_2薄膜( XAES)。通过监测B 1s,Mg 2p,O 1s核心能级和Mg KL_2L_3 Auger线研究了电子结构。为了进行比较,还研究了MgB_2市售超导溅射靶,未退火的前体膜和通过直接溅射从MgB_2靶获得的样品的电子结构。电子光谱表明,在超导系统中,Mg KL_2L_3俄歇线的动能位置相对于在非超导样品中测量的同一俄歇线的能量位置总是高约0.9 eV。

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