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Analysis Of The Nonlinear Absorption Mechanisms In Ablation Of Transparent Materials By High-intensity And Ultrashort Laser Pulses

机译:高强度超短激光脉冲烧蚀透明材料的非线性吸收机理分析

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摘要

The mechanisms of nonlinear absorption in transparent materials under irradiation with ultrashort laser pulses are considered theoretically. Nitride semiconductor, sapphire and others transparent dielectrics were investigated. The ablation threshold for these materials is within multi-TW/cm~2 range. The model was used based on the tunneling absorption under the irradiation by high-intensity ultrashort pulses in terms of the theory of ionization of solid in a field of strong electromagnetic wave. The effect of the energy gap of material on the threshold of laser ablation was adequately explained.
机译:从理论上考虑了透明材料在超短激光脉冲照射下的非线性吸收机理。研究了氮化物半导体,蓝宝石和其他透明电介质。这些材料的烧蚀阈值在multi-TW / cm〜2范围内。根据强电磁波场中固体的电离理论,基于高强度超短脉冲辐射下的隧穿吸收来使用该模型。充分解释了材料的能隙对激光烧蚀阈值的影响。

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