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首页> 外文期刊>Applied Physics >Nanosecond and femtosecond ablation of La-0.6Ca-0.4CoO-3:a comparison between plume dynamics and composition of the films
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Nanosecond and femtosecond ablation of La-0.6Ca-0.4CoO-3:a comparison between plume dynamics and composition of the films

机译:La-0.6Ca-0.4CoO-3的纳秒和飞秒消融:羽流动力学与薄膜成分的比较

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摘要

Thin films of La-0.6Ca-0.4CoO-3 were grown by pulsed laser ablation with nanosecond and femtosecond pulses. The films deposited with femtosecond pulses (248 nm, 500 fs pulse duration) exhibit a higher surface roughness and deficiency in the cobalt content compared to the films deposited with nanosecond pulses (248 nm, 20 ns pulse duration). The origin of these pronounced differences between the films grown by ns and fs ablation has been studied in detail by time-resolved optical emission spectroscopy and imaging. The plumes generated by nanosecond and femtosecond ablation were analyzed in vacuum and in a background pressure of 60 Pa of oxygen. The ns-induced plume in vacuum exhibits a spherical shape, while for femtosecond ablation the plume is more elongated along the expansion direction, but with similar velocities for ns and fs laser ablation. In the case of ablation in the background gas similar velocities of the plume species are observed for fs and ns laser ablation. The different film compositions are therefore not related to different kinetic energies and different distributions of various species in the plasma plume which has been identified as the origin of the deficiency of species for other materials.
机译:通过使用纳秒和飞秒脉冲的脉冲激光烧蚀来生长La-0.6Ca-0.4CoO-3薄膜。与用纳秒脉冲(248 nm,20 ns脉冲持续时间)沉积的薄膜相比,用飞秒脉冲(248 nm,500 fs脉冲持续时间)沉积的薄膜显示出更高的表面粗糙度和钴含量的不足。 ns和fs烧蚀生长的薄膜之间这些明显差异的起因已通过时间分辨光发射光谱法和成像进行了详细研究。在真空和60 Pa的氧气本底压力下分析了纳秒和飞秒烧蚀产生的羽流。真空中ns诱导的羽流呈现球形,而对于飞秒消融,羽流沿扩展方向更细长,但是ns和fs激光消融的速度相似。在背景气体中进行烧蚀的情况下,对于fs和ns激光烧蚀,观察到的羽状物质的速度相似。因此,不同的膜组成与等离子体羽中的各种动能和各种物质的不同分布无关,血浆羽流已被认为是其他材料缺乏物质的根源。

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  • 来源
    《Applied Physics 》 |2011年第1期| p.167-176| 共10页
  • 作者单位

    Department of Photonics Engineering, Technical University of Denmark, 4000 Roskilde, Denmark;

    Institute of Electronic Structure and Laser, Foundation for Research and Technology-Hellas, P.O. Box 1385, 71110 Heraklion, Greece;

    Institute of Electronic Structure and Laser, Foundation for Research and Technology-Hellas, P.O. Box 1385, 71110 Heraklion, Greece;

    Institute of Electronic Structure and Laser, Foundation for Research and Technology-Hellas, P.O. Box 1385, 71110 Heraklion, Greece;

    Department of Chemistry, University of Crete, P.O. Box 2208,710 03 Heraklion, Greece;

    Department of General Energy Research, Paul Scherrer Institut,5232 Villigen, Switzerland;

    ALSTOM AG, Zentralstrasse 40, 5242 Birr, Switzerland;

    Laboratory of Ion Beam Physics, ETH Zurich, 8093 Zurich,Switzerland;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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  • 正文语种 eng
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