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机译:铜界面层对铁磁体向石墨烯自旋注入的影响
Department of Electrical and Computer Engineering, National University of Singapore, 4 Engineering Drive 3, Singapore 117576, Singapore,NUS Graduate School for Integrative Sciences and Engineering,Centre for Life Sciences (CeLS), #05-01, 28 Medical Drive,Singapore 117456, Singapore;
Department of Electrical and Computer Engineering, National University of Singapore, 4 Engineering Drive 3, Singapore 117576, Singapore;
Department of Electrical and Computer Engineering, National University of Singapore, 4 Engineering Drive 3, Singapore 117576, Singapore;
Department of Electrical and Computer Engineering, National University of Singapore, 4 Engineering Drive 3, Singapore 117576, Singapore;
机译:具有Cu界面层的增强的自旋注入从铁磁体到石墨烯
机译:具有Cu界面层的增强的自旋注入从铁磁体到石墨烯
机译:Cu界面层厚度对NiFe / Cu /石墨烯自旋阀自旋注入效率的影响
机译:通过超薄铁磁层的自旋极化光电子源和自旋相关的自由电子注入
机译:铁磁尖晶石型铜铬溴化硒硒,锰掺杂的黄铜矿二碲化镓镓和钌酸钌酸铋的反常霍尔效应及相关的输运现象。
机译:偏置在铁磁体/双层-hBN /石墨烯/ hBN异质结构中诱导高达100%的自旋注入和检测极化
机译:偏置在铁磁体/双层-hBN /石墨烯/ hBN异质结构中诱导高达100%的自旋注入和检测极化