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The effect of a copper interfacial layer on spin injection from ferromagnet to graphene

机译:铜界面层对铁磁体向石墨烯自旋注入的影响

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摘要

Aiming at enhancing the spin-injection efficiency from ferromagnet to graphene, graphene-based spin valve devices with ferromagnet-Cu-graphene contacts have been fabricated and studied. The ferromagnet-Cu-graphene contact has attracted our attention because of the spin-preserving characteristic of ferromagnet-Cu interface and possible presence of moderate potential barrier at the Cu-graphene interface. The latter may help to alleviate the conductance mismatch issue in spin injection from ferromagnet to graphene. Devices with or without Cu interfacial layers have been fabricated by both evaporation and sputtering on mechanically exfoliated graphene sheets. A potential barrier of 33 meV was derived for the Cu-graphene interface in evaporation-deposited devices from the temperature-dependence of contact resistance. On the other hand, pure ferromagnet-graphene contact exhibits a much lower contact resistance due to its chemisorption interface with graphene. Nonlocal magnetoresistance measurements showed a moderate enhancement of spin injection efficiency with the aid of the Cu interfacial layer.
机译:为了提高从铁磁体到石墨烯的自旋注入效率,已经制造并研究了具有铁磁体-Cu-石墨烯触点的基于石墨烯的自旋阀装置。铁磁体-Cu-石墨烯的接触吸引了我们的注意力,因为铁磁体-Cu界面的自旋保持特性以及在Cu-石墨烯界面可能存在适度的势垒。后者可能有助于减轻自旋注入从铁磁体到石墨烯的电导失配问题。通过在机械剥离的石墨烯片上进行蒸发和溅射,可以制造出具有或不具有Cu界面层的器件。根据接触电阻的温度依赖性,得出了蒸发沉积器件中的铜-石墨烯界面的势垒为33 meV。另一方面,纯铁磁体-石墨烯接触由于其与石墨烯的化学吸附界面而显示出低得多的接触电阻。非局部磁阻测量结果显示,借助Cu界面层,自旋注入效率有所提高。

著录项

  • 来源
    《Applied Physics》 |2013年第2期|339-345|共7页
  • 作者单位

    Department of Electrical and Computer Engineering, National University of Singapore, 4 Engineering Drive 3, Singapore 117576, Singapore,NUS Graduate School for Integrative Sciences and Engineering,Centre for Life Sciences (CeLS), #05-01, 28 Medical Drive,Singapore 117456, Singapore;

    Department of Electrical and Computer Engineering, National University of Singapore, 4 Engineering Drive 3, Singapore 117576, Singapore;

    Department of Electrical and Computer Engineering, National University of Singapore, 4 Engineering Drive 3, Singapore 117576, Singapore;

    Department of Electrical and Computer Engineering, National University of Singapore, 4 Engineering Drive 3, Singapore 117576, Singapore;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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