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首页> 外文期刊>Applied Physics >Interaction of terahertz radiation with surface and interface plasmon-phonons in AlGaAs/GaAs and GaN/Al_2O_3 heterostructures
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Interaction of terahertz radiation with surface and interface plasmon-phonons in AlGaAs/GaAs and GaN/Al_2O_3 heterostructures

机译:太赫兹辐射与AlGaAs / GaAs和GaN / Al_2O_3异质结构中的表面和界面等离振子-声子的相互作用

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摘要

Surface phonon and plasmon-phonon polari-ton characteristics of GaAs, Al_xGa_(1-x)As/GaAs, and GaN/ Al_2O_3 layered structures are investigated by means of terahertz radiation reflection spectroscopy. The strong resonant absorption peaks and selective emission of the THz radiation dependent upon the lattice composition and free electron density in these layered structures are experimentally observed and analyzed.
机译:利用太赫兹辐射反射光谱研究了GaAs,Al_xGa_(1-x)As / GaAs和GaN / Al_2O_3层状结构的表面声子和等离子体激元极化特性。实验观察和分析了这些分层结构中取决于晶格组成和自由电子密度的强共振吸收峰和太赫兹辐射的选择性发射。

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  • 来源
    《Applied Physics》 |2013年第1期|153-156|共4页
  • 作者单位

    Semiconductor Physics Institute, Center for Physical Sciences and Technology, Vilnius 01108, Lithuania;

    Semiconductor Physics Institute, Center for Physical Sciences and Technology, Vilnius 01108, Lithuania;

    Semiconductor Physics Institute, Center for Physical Sciences and Technology, Vilnius 01108, Lithuania;

    Semiconductor Physics Institute, Center for Physical Sciences and Technology, Vilnius 01108, Lithuania;

    Semiconductor Physics Institute, Center for Physical Sciences and Technology, Vilnius 01108, Lithuania;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
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