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机译:通过相分离光刻技术制备晶圆级纳米图案蓝宝石衬底
Department of Materials Science and Engineering, College of Engineering and Applied Sciences, Nanjing University, Nanjing 210093, China,National Laboratory of Solid State Microstructures, Nanjing 210093, China;
Department of Materials Science and Engineering, College of Engineering and Applied Sciences, Nanjing University, Nanjing 210093, China,National Laboratory of Solid State Microstructures, Nanjing 210093, China;
National Laboratory of Solid State Microstructures, Nanjing 210093, China,Jiangsu Provincial Key Laboratory of Advanced Photonic and Electronic Materials, School of Electronic Science and Engineering, Nanjing University, Nanjing 210093, China;
National Laboratory of Solid State Microstructures, Nanjing 210093, China,Jiangsu Provincial Key Laboratory of Advanced Photonic and Electronic Materials, School of Electronic Science and Engineering, Nanjing University, Nanjing 210093, China;
Nantong TongFang Semiconductor Co., Ltd., Nantong, China;
Department of Materials Science and Engineering, College of Engineering and Applied Sciences, Nanjing University, Nanjing 210093, China,National Laboratory of Solid State Microstructures, Nanjing 210093, China,Collaborative Innovation Center of Advanced Microstructures, Nanjing 210093, China;
Department of Materials Science and Engineering, College of Engineering and Applied Sciences, Nanjing University, Nanjing 210093, China,National Laboratory of Solid State Microstructures, Nanjing 210093, China,Collaborative Innovation Center of Advanced Microstructures, Nanjing 210093, China;
Department of Materials Science and Engineering, College of Engineering and Applied Sciences, Nanjing University, Nanjing 210093, China,National Laboratory of Solid State Microstructures, Nanjing 210093, China,Collaborative Innovation Center of Advanced Microstructures, Nanjing 210093, China;
Department of Materials Science and Engineering, College of Engineering and Applied Sciences, Nanjing University, Nanjing 210093, China,National Laboratory of Solid State Microstructures, Nanjing 210093, China,Collaborative Innovation Center of Advanced Microstructures, Nanjing 210093, China;
机译:通过激光干涉光刻技术对图案化的Al薄膜进行退火来制备纳米图案化的蓝宝石衬底
机译:纳米图案蓝宝石衬底工艺上多曝光和多光束激光干涉光刻的通量比较
机译:纳米图案蓝宝石衬底上生长的GaN基LED的制造和表征
机译:通过AFM阳极氧化光刻在溶液和气相中的开环复分解聚合制备纳米透明性聚合物结构
机译:纳米点装饰蓝宝石衬底的制造,用于氮化镓的简单生长模式沉积。
机译:通过软紫外-纳米压印光刻技术对图案化的Al薄膜进行退火处理大规模制造纳米图案化的蓝宝石衬底
机译:通过软紫外-纳米压印光刻技术对图案化的Al薄膜进行退火处理,大规模制造纳米图案化的蓝宝石衬底